Interface Engineering Enabled Low Temperature Growth of Magnetic Insulator on Topological Insulator

Interface Engineering Enabled Low Temperature Growth of Magnetic Insulator on Topological Insulator

Abstract Combining topological insulators (TIs) and magnetic materials in heterostructures is crucial for advancing spin‐based electronics. Magnetic insulators (MIs) can be deposited on TIs using the spin‐spray process, which is a unique nonvacuum, low‐temperature growth process. TIs have highly rea...

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Bibliographic Details
Main Authors: Nirjhar Bhattacharjee, Krishnamurthy Mahalingam, Alexandria Will‐Cole, Yuyi Wei, Adrian Fedorko, Cynthia T. Bowers, Michael Page, Michael McConney, Don Heiman, Nian Xiang Sun
Format: Article
Language:English
Published: Wiley-VCH 2022-12-01
Series:Advanced Materials Interfaces
Subjects:
ferromagnets
interfaces
magnetic topological insulators
topological insulators
van der Waals materials
Online Access:https://doi.org/10.1002/admi.202201691
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https://doi.org/10.1002/admi.202201691

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