Silicon Nitride/Silicon Dioxide Echelle Grating Spectrometer for Operation Near 1.55 μm

Here we use an electron beam lithography system to pattern an <inline-formula><tex-math notation="LaTeX"> ${\rm{S}}{{\rm{i}}_{3}}{{\rm{N}}_{4}}{\rm{/Si}}{{\rm{O}}_{2}}$</tex-math></inline-formula> echelle grating using silver as a reflector on the grating grooves. T...

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Bibliographic Details
Main Authors: Shengjie Xie, Yang Meng, Joss Bland-Hawthorn, Sylvain Veilleux, Mario Dagenais
Format: Article
Language:English
Published: IEEE 2018-01-01
Series:IEEE Photonics Journal
Subjects:
Online Access:https://ieeexplore.ieee.org/document/8538877/
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