Properties of titanium thin film deposited by RF and DC magnetron sputtering at low temperatures
Ti thin films with superior surface properties are deposited in a low-temperature processing environment. The properties of Ti films deposited by magnetron sputtering at substrate temperatures below 200 °C and different RF (radio frequency, 13.56 MHz) and DC (direct current) powers were examined. In...
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| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2025-06-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/5.0264499 |
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