Research on the application of thermal field emission gun in electron beam lithography
The classification and characteristics of electron gun are introduced, with emphasis on the principle, structure and characteristics of thermal field emission gun and its application in electron beam lithography machine. The relationship between the beam current of the electron beam lithography mach...
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| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | Chinese |
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National Computer System Engineering Research Institute of China
2022-04-01
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| Series: | Dianzi Jishu Yingyong |
| Subjects: | |
| Online Access: | http://www.chinaaet.com/article/3000148317 |
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| _version_ | 1839639543529078784 |
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| author | Hao Xiaoliang Zhao Yingwei Sun Hu Wang Xiuhai Cao Jian Ma Peisheng Ren Zesheng |
| author_facet | Hao Xiaoliang Zhao Yingwei Sun Hu Wang Xiuhai Cao Jian Ma Peisheng Ren Zesheng |
| author_sort | Hao Xiaoliang |
| collection | DOAJ |
| description | The classification and characteristics of electron gun are introduced, with emphasis on the principle, structure and characteristics of thermal field emission gun and its application in electron beam lithography machine. The relationship between the beam current of the electron beam lithography machine and the extractor current of the electron gun is described, and the influence of the parameters of the thermal field emission gun on the extractor current is analyzed. The influence of the adjustment of the thermal field emission gun on the electron beam lithography process is studied, and the relationship between the beam spot and the beam current is obtained through experiments. Finally, by adjusting the parameters of the electron gun, different lithography patterns are prepared to meet the requirements of different lithography processes, and the conclusions of the analysis are verified. |
| format | Article |
| id | doaj-art-c931eeeaebfa4699b20f29f43b8f2a19 |
| institution | Matheson Library |
| issn | 0258-7998 |
| language | zho |
| publishDate | 2022-04-01 |
| publisher | National Computer System Engineering Research Institute of China |
| record_format | Article |
| series | Dianzi Jishu Yingyong |
| spelling | doaj-art-c931eeeaebfa4699b20f29f43b8f2a192025-07-04T08:21:50ZzhoNational Computer System Engineering Research Institute of ChinaDianzi Jishu Yingyong0258-79982022-04-01484444710.16157/j.issn.0258-7998.2122453000148317Research on the application of thermal field emission gun in electron beam lithographyHao Xiaoliang0Zhao Yingwei1Sun Hu2Wang Xiuhai3Cao Jian4Ma Peisheng5Ren Zesheng6The 13th Research Institute of China Electronics Technology Group Corporation，Shijiazhuang 050051，ChinaThe 13th Research Institute of China Electronics Technology Group Corporation，Shijiazhuang 050051，ChinaThe 13th Research Institute of China Electronics Technology Group Corporation，Shijiazhuang 050051，ChinaThe 13th Research Institute of China Electronics Technology Group Corporation，Shijiazhuang 050051，ChinaThe 13th Research Institute of China Electronics Technology Group Corporation，Shijiazhuang 050051，ChinaThe 13th Research Institute of China Electronics Technology Group Corporation，Shijiazhuang 050051，ChinaThe 13th Research Institute of China Electronics Technology Group Corporation，Shijiazhuang 050051，ChinaThe classification and characteristics of electron gun are introduced, with emphasis on the principle, structure and characteristics of thermal field emission gun and its application in electron beam lithography machine. The relationship between the beam current of the electron beam lithography machine and the extractor current of the electron gun is described, and the influence of the parameters of the thermal field emission gun on the extractor current is analyzed. The influence of the adjustment of the thermal field emission gun on the electron beam lithography process is studied, and the relationship between the beam spot and the beam current is obtained through experiments. Finally, by adjusting the parameters of the electron gun, different lithography patterns are prepared to meet the requirements of different lithography processes, and the conclusions of the analysis are verified.http://www.chinaaet.com/article/3000148317thermal field emission(tfe)gunelectron beam currentelectron beam spotelectron beam lithography machine |
| spellingShingle | Hao Xiaoliang Zhao Yingwei Sun Hu Wang Xiuhai Cao Jian Ma Peisheng Ren Zesheng Research on the application of thermal field emission gun in electron beam lithography Dianzi Jishu Yingyong thermal field emission(tfe)gun electron beam current electron beam spot electron beam lithography machine |
| title | Research on the application of thermal field emission gun in electron beam lithography |
| title_full | Research on the application of thermal field emission gun in electron beam lithography |
| title_fullStr | Research on the application of thermal field emission gun in electron beam lithography |
| title_full_unstemmed | Research on the application of thermal field emission gun in electron beam lithography |
| title_short | Research on the application of thermal field emission gun in electron beam lithography |
| title_sort | research on the application of thermal field emission gun in electron beam lithography |
| topic | thermal field emission(tfe)gun electron beam current electron beam spot electron beam lithography machine |
| url | http://www.chinaaet.com/article/3000148317 |
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