Research on the application of thermal field emission gun in electron beam lithography

The classification and characteristics of electron gun are introduced, with emphasis on the principle, structure and characteristics of thermal field emission gun and its application in electron beam lithography machine. The relationship between the beam current of the electron beam lithography mach...

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Bibliographic Details
Main Authors: Hao Xiaoliang, Zhao Yingwei, Sun Hu, Wang Xiuhai, Cao Jian, Ma Peisheng, Ren Zesheng
Format: Article
Language:Chinese
Published: National Computer System Engineering Research Institute of China 2022-04-01
Series:Dianzi Jishu Yingyong
Subjects:
Online Access:http://www.chinaaet.com/article/3000148317
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