Xiaoliang, H., Yingwei, Z., Hu, S., Xiuhai, W., Jian, C., Peisheng, M., & Zesheng, R. (2022). Research on the application of thermal field emission gun in electron beam lithography. National Computer System Engineering Research Institute of China.
Chicago Style (17th ed.) CitationXiaoliang, Hao, Zhao Yingwei, Sun Hu, Wang Xiuhai, Cao Jian, Ma Peisheng, and Ren Zesheng. Research on the Application of Thermal Field Emission Gun in Electron Beam Lithography. National Computer System Engineering Research Institute of China, 2022.
MLA (9th ed.) CitationXiaoliang, Hao, et al. Research on the Application of Thermal Field Emission Gun in Electron Beam Lithography. National Computer System Engineering Research Institute of China, 2022.
Warning: These citations may not always be 100% accurate.