High-Performance and Fabrication-Tolerant 3 dB Adiabatic Coupler Based on Ultralow-Loss Silicon Waveguide by Tri-Layer Hard Mask Etching Process
Silicon photonics has emerged as critical for advancing photonic integrated circuits (PICs), but waveguide losses, primarily resulting from sidewall roughness, remain a primary challenge. In this work, we demonstrate a tri-layer hard mask etching process that produces strip silicon waveguides with p...
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| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2025-06-01
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| Series: | Nanomaterials |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2079-4991/15/12/947 |
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