Real‐Time Self‐Optimization of Quantum Dot Laser Emissions During Machine Learning‐Assisted Epitaxy

Real‐Time Self‐Optimization of Quantum Dot Laser Emissions During Machine Learning‐Assisted Epitaxy

Abstract Traditional methods for optimizing light source emissions rely on a time‐consuming trial‐and‐error approach. While in situ optimization of light source gain media emission during growth is ideal, it has yet to be realized. In this work, in situ reflection high‐energy electron diffraction (R...

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Main Authors: Chao Shen, Wenkang Zhan, Shujie Pan, Hongyue Hao, Ning Zhuo, Kaiyao Xin, Hui Cong, Chi Xu, Bo Xu, Tien Khee Ng, Siming Chen, Chunlai Xue, Zhanguo Wang, Chao Zhao
Format: Article
Language:English
Published: Wiley 2025-07-01
Series:Advanced Science
Subjects:
laser
machine learning
molecular beam epitaxy
quantum dots
real‐time control
Online Access:https://doi.org/10.1002/advs.202503059
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https://doi.org/10.1002/advs.202503059

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