Koval’chuk, N. S., Demidovich, S. A., Vlasukova, L. A., & Parkhomenko, I. N. (2024). Deposition of SiN<sub>x</sub> Films with Controlled Residual Stress from SiH<sub>4</sub>-NH<sub>3</sub>-He Gaseous Mixture in Inductively Coupled Plasma. Educational institution «Belarusian State University of Informatics and Radioelectronics».
Chicago Style (17th ed.) CitationKoval’chuk, N. S., S. A. Demidovich, L. A. Vlasukova, and I. N. Parkhomenko. Deposition of SiN<sub>x</sub> Films with Controlled Residual Stress from SiH<sub>4</sub>-NH<sub>3</sub>-He Gaseous Mixture in Inductively Coupled Plasma. Educational institution «Belarusian State University of Informatics and Radioelectronics», 2024.
MLA (9th ed.) CitationKoval’chuk, N. S., et al. Deposition of SiN<sub>x</sub> Films with Controlled Residual Stress from SiH<sub>4</sub>-NH<sub>3</sub>-He Gaseous Mixture in Inductively Coupled Plasma. Educational institution «Belarusian State University of Informatics and Radioelectronics», 2024.