Plasma Systems in Thin Film Technology

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Plasma Systems in Thin Film Technology

The article discusses the current trends in the development of ion-plasma systems for ion processing and thin film deposition. Application of pulsed reactive magnetron sputtering for deposition of vanadium oxide films and dependence of process parameters on power supply frequency characteristics, pe...

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Bibliographic Details
Main Authors:	A. P. Dostanko, S. I. Madveyko, E. V. Telesh, S. N. Melnikov, S. M. Zavadski, D. A. Golosov
Format:	Article
Language:	Russian
Published:	Educational institution «Belarusian State University of Informatics and Radioelectronics» 2024-04-01
Series:	Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
Subjects:	ion-plasma system ion-beam source magnetron sputtering system thin film deposition reactive sputtering magnetron sputtering model
Online Access:	https://doklady.bsuir.by/jour/article/view/3902
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