Growth and characterization of strontium vanadate films deposited by reactive magnetron sputtering
Indium-tin oxide (ITO) is the most commonly used transparent conducting oxide (TCO) but suffers from resource depletion. Among all the alternatives to replace it, SrVO3 is a promising candidate that has been highly studied in recent years. In this study, structural, electrical, and optical propertie...
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| Format: | Article |
| Language: | English |
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AIP Publishing LLC
2025-06-01
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| Series: | APL Materials |
| Online Access: | http://dx.doi.org/10.1063/5.0253471 |
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| author | Axel Rouviller Moussa Mezhoud Christian Dufour Clara Grygiel Ulrike Lüders Xavier Portier Fabrice Gourbilleau |
| author_facet | Axel Rouviller Moussa Mezhoud Christian Dufour Clara Grygiel Ulrike Lüders Xavier Portier Fabrice Gourbilleau |
| author_sort | Axel Rouviller |
| collection | DOAJ |
| description | Indium-tin oxide (ITO) is the most commonly used transparent conducting oxide (TCO) but suffers from resource depletion. Among all the alternatives to replace it, SrVO3 is a promising candidate that has been highly studied in recent years. In this study, structural, electrical, and optical properties of 30 nm thick films grown on low-cost substrates by reactive sputtering of a SrVO3 target are presented. The structural, electrical, and optical properties of the obtained films have been compared to those of our previous study in which thin films were grown using a Sr2V2O7 target, illustrating that the use of an SrVO3 target allows us to obtain layers with lower roughness and better opto-electronic properties. Moreover, it was observed that the layers are non-stoichiometric compared to SrVO3, which can explain their semiconducting properties instead of the expected metallic behavior. |
| format | Article |
| id | doaj-art-5aabdba5c6cb44c1a7dd2ae546b09077 |
| institution | Matheson Library |
| issn | 2166-532X |
| language | English |
| publishDate | 2025-06-01 |
| publisher | AIP Publishing LLC |
| record_format | Article |
| series | APL Materials |
| spelling | doaj-art-5aabdba5c6cb44c1a7dd2ae546b090772025-07-02T17:45:54ZengAIP Publishing LLCAPL Materials2166-532X2025-06-01136061111061111-1210.1063/5.0253471Growth and characterization of strontium vanadate films deposited by reactive magnetron sputteringAxel Rouviller0Moussa Mezhoud1Christian Dufour2Clara Grygiel3Ulrike Lüders4Xavier Portier5Fabrice Gourbilleau6CIMAP, Normandie Université, ENSICAEN, UNICAEN, CNRS, 14050 Caen Cedex 4, FranceCRISMAT, CNRS UMR6508, Normandie Université, ENSICAEN, UNICAEN, 14050 Caen Cedex 4, FranceCIMAP, Normandie Université, ENSICAEN, UNICAEN, CNRS, 14050 Caen Cedex 4, FranceCIMAP, Normandie Université, ENSICAEN, UNICAEN, CNRS, 14050 Caen Cedex 4, FranceCRISMAT, CNRS UMR6508, Normandie Université, ENSICAEN, UNICAEN, 14050 Caen Cedex 4, FranceCIMAP, Normandie Université, ENSICAEN, UNICAEN, CNRS, 14050 Caen Cedex 4, FranceCIMAP, Normandie Université, ENSICAEN, UNICAEN, CNRS, 14050 Caen Cedex 4, FranceIndium-tin oxide (ITO) is the most commonly used transparent conducting oxide (TCO) but suffers from resource depletion. Among all the alternatives to replace it, SrVO3 is a promising candidate that has been highly studied in recent years. In this study, structural, electrical, and optical properties of 30 nm thick films grown on low-cost substrates by reactive sputtering of a SrVO3 target are presented. The structural, electrical, and optical properties of the obtained films have been compared to those of our previous study in which thin films were grown using a Sr2V2O7 target, illustrating that the use of an SrVO3 target allows us to obtain layers with lower roughness and better opto-electronic properties. Moreover, it was observed that the layers are non-stoichiometric compared to SrVO3, which can explain their semiconducting properties instead of the expected metallic behavior.http://dx.doi.org/10.1063/5.0253471 |
| spellingShingle | Axel Rouviller Moussa Mezhoud Christian Dufour Clara Grygiel Ulrike Lüders Xavier Portier Fabrice Gourbilleau Growth and characterization of strontium vanadate films deposited by reactive magnetron sputtering APL Materials |
| title | Growth and characterization of strontium vanadate films deposited by reactive magnetron sputtering |
| title_full | Growth and characterization of strontium vanadate films deposited by reactive magnetron sputtering |
| title_fullStr | Growth and characterization of strontium vanadate films deposited by reactive magnetron sputtering |
| title_full_unstemmed | Growth and characterization of strontium vanadate films deposited by reactive magnetron sputtering |
| title_short | Growth and characterization of strontium vanadate films deposited by reactive magnetron sputtering |
| title_sort | growth and characterization of strontium vanadate films deposited by reactive magnetron sputtering |
| url | http://dx.doi.org/10.1063/5.0253471 |
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