A‐Site Cationic Variation to Expand the Sacrificial Layer AVO3 Family Dissolving in Water

A‐Site Cationic Variation to Expand the Sacrificial Layer AVO3 Family Dissolving in Water

Abstract In the growing field of low‐cost electronics, the epitaxy of complex oxide thin films on a Si substrate requires significant technical means. Therefore, a large attention is paid to the release of a freestanding oxide of interest from its deposition support which is then placed onto a low‐c...

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Bibliographic Details
Main Authors: Vincent Polewczyk, Bruno Bérini, Aïmane Cheikh, Deepak Dagur, Moussa Mezhoud, Oualyd El‐Khaloufi, Moussa Mebarki, Luca Braglia, Simon Hurand, Arnaud Fouchet, Giovanni Vinai, Piero Torelli, Adrian David, Yves Dumont, Ulrike Lüders
Format: Article
Language:English
Published: Wiley-VCH 2025-06-01
Series:Advanced Materials Interfaces
Subjects:
flexible electronics
low‐cost electronics
sacrificial layer
thin film
water etching
Online Access:https://doi.org/10.1002/admi.202500094
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https://doi.org/10.1002/admi.202500094

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