Monitoring the Etching Process of Hi-Bi Fiber Through a Fiber Loop Mirror

A method for monitoring the etching process of Hi-Bi fiber is proposed and demonstrated. The birefringence of the etching fiber is accurately calculated by tracking the shift of the interference spectrum in a high-birefringence fiber loop mirror interferometer. Then, the degree of etching can be inf...

Full description

Saved in:
Bibliographic Details
Main Authors: Danling Wu, Jun Zhu, Hui Wang, Benli Yu
Format: Article
Language:English
Published: IEEE 2017-01-01
Series:IEEE Photonics Journal
Subjects:
Online Access:https://ieeexplore.ieee.org/document/8064194/
Tags: Add Tag
No Tags, Be the first to tag this record!