Plasma-Chemical Kinetics of Film Deposition in Argon-Methane and Argon-Acetylene Mixtures Under Atmospheric Pressure Conditions

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Plasma-Chemical Kinetics of Film Deposition in Argon-Methane and Argon-Acetylene Mixtures Under Atmospheric Pressure Conditions

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Dettagli Bibliografici
Autori principali:	Pothiraja, Ramasamy, Bibinov, Nikita, Awakowicz, Peter
Natura:	Elettronico Capitolo di libro
Lingua:	inglese
Pubblicazione:	IntechOpen 2012
Soggetti:	Physical Sciences, Engineering and Technology
Accesso online:	https://www.intechopen.com/chapters/29720
Tags:	Aggiungi Tag Nessun Tag, puoi essere il primo ad aggiungerne!!

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