Plasma-Chemical Kinetics of Film Deposition in Argon-Methane and Argon-Acetylene Mixtures Under Atmospheric Pressure Conditions

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Plasma-Chemical Kinetics of Film Deposition in Argon-Methane and Argon-Acetylene Mixtures Under Atmospheric Pressure Conditions

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Bibliographic Details
Main Authors:	Pothiraja, Ramasamy, Bibinov, Nikita, Awakowicz, Peter
Format:	Electronic Book Chapter
Language:	English
Published:	IntechOpen 2012
Subjects:	Physical Sciences, Engineering and Technology
Online Access:	https://www.intechopen.com/chapters/29720
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