Atomic Layer Deposition of High-k Oxides on Graphene
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| Main Authors: | , , , , , |
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| Format: | Electronic Book Chapter |
| Language: | English |
| Published: |
IntechOpen
2011
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| Online Access: | https://www.intechopen.com/chapters/19780 |
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| _version_ | 1839565458051694592 |
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| author | Alles, Harry Aarik, Jaan Kozlova, Jekaterina Niilisk, Ahti Rammula, Raul Sammelselg, Väino |
| author_facet | Alles, Harry Aarik, Jaan Kozlova, Jekaterina Niilisk, Ahti Rammula, Raul Sammelselg, Väino |
| author_sort | Alles, Harry |
| collection | InTech Open eBooks |
| description | None |
| doi_str_mv | 10.5772/20801 |
| first_indexed | 2025-08-04T22:25:30Z |
| format | Electronic Book Chapter |
| fullrecord | <oai_dc:dc xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd"><identifier>InTech-19780</identifier><datestamp>2011-09-15</datestamp>
<dc:title>Atomic Layer Deposition of High-k Oxides on Graphene</dc:title>
<dc:creator>Harry Alles</dc:creator>
<dc:creator>Jaan Aarik</dc:creator>
<dc:creator>Jekaterina Kozlova</dc:creator>
<dc:creator>Ahti Niilisk</dc:creator>
<dc:creator>Raul Rammula</dc:creator>
<dc:creator>Väino Sammelselg</dc:creator>
<dc:subject>Physical Sciences, Engineering and Technology</dc:subject>
<dc:description>None</dc:description>
<dc:publisher>IntechOpen</dc:publisher>
<dc:date>2011-09-15</dc:date>
<dc:type>Chapter, Part Of Book</dc:type>
<dc:identifier>https://www.intechopen.com/chapters/19780</dc:identifier>
<dc:identifier>doi:10.5772/20801</dc:identifier>
<dc:language>en</dc:language>
<dc:relation>ISBN:978-953-307-292-0</dc:relation>
<dc:rights>https://creativecommons.org/licenses/by-nc-sa/3.0/</dc:rights>
<dc:source>https://www.intechopen.com/books/1275 ; Graphene - Synthesis, Characterization, Properties and Applications</dc:source>
</oai_dc:dc> |
| id | InTech-19780 |
| institution | Matheson Library |
| isbn | 978-953-307-292-0 |
| language | English |
| last_indexed | 2025-08-04T22:25:30Z |
| publishDate | 2011 |
| publisher | IntechOpen |
| record_format | intech |
| spelling | InTech-197802011-09-15 Atomic Layer Deposition of High-k Oxides on Graphene Harry Alles Jaan Aarik Jekaterina Kozlova Ahti Niilisk Raul Rammula Väino Sammelselg Physical Sciences, Engineering and Technology None IntechOpen 2011-09-15 Chapter, Part Of Book https://www.intechopen.com/chapters/19780 doi:10.5772/20801 en ISBN:978-953-307-292-0 https://creativecommons.org/licenses/by-nc-sa/3.0/ https://www.intechopen.com/books/1275 ; Graphene - Synthesis, Characterization, Properties and Applications |
| spellingShingle | Physical Sciences, Engineering and Technology Alles, Harry Aarik, Jaan Kozlova, Jekaterina Niilisk, Ahti Rammula, Raul Sammelselg, Väino Atomic Layer Deposition of High-k Oxides on Graphene |
| title | Atomic Layer Deposition of High-k Oxides on Graphene |
| title_full | Atomic Layer Deposition of High-k Oxides on Graphene |
| title_fullStr | Atomic Layer Deposition of High-k Oxides on Graphene |
| title_full_unstemmed | Atomic Layer Deposition of High-k Oxides on Graphene |
| title_short | Atomic Layer Deposition of High-k Oxides on Graphene |
| title_sort | atomic layer deposition of high k oxides on graphene |
| topic | Physical Sciences, Engineering and Technology |
| url | https://www.intechopen.com/chapters/19780 |
| work_keys_str_mv | AT allesharry atomiclayerdepositionofhighkoxidesongraphene AT aarikjaan atomiclayerdepositionofhighkoxidesongraphene AT kozlovajekaterina atomiclayerdepositionofhighkoxidesongraphene AT niiliskahti atomiclayerdepositionofhighkoxidesongraphene AT rammularaul atomiclayerdepositionofhighkoxidesongraphene AT sammelselgvaino atomiclayerdepositionofhighkoxidesongraphene |