Effect of Native Oxide on the Electric Field-induced Characteristics of Device-quality Silicon at Room Temperature
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| Main Authors: | Khlyap, Halyna, Laptev, Viktor, Pankiv, Luydmila, Tsmots, Volodymyr |
|---|---|
| Format: | Electronic Book Chapter |
| Language: | English |
| Published: |
IntechOpen
2011
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| Subjects: | |
| Online Access: | https://www.intechopen.com/chapters/17723 |
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