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    Determination of Reactive RF-Sputtering Parameters for Fabrication of SiOx Films With Specified Refractive Index, for Highly Reflective SiOx Distributed Bragg Reflector

    Determination of Reactive RF-Sputtering Parameters for Fabrication of SiOx Films With Specified Refractive Index, for Highly Reflective SiOx Distributed Bragg Reflector by Elnaz Afsharipour, Byoungyoul Park, Cyrus Shafai

    Published 2017-01-01
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