APA (7th ed.) Citation

Li, M., Liu, Y., Qi, X., Ma, W., Xu, Y., Hu, Z., & Wu, Y. (2025). Suppression of the surface roughness by adjusting the temperature distribution in the top-seeded solution growth of SiC crystal. Elsevier.

Chicago Style (17th ed.) Citation

Li, Mengyu, Yuhui Liu, Xiaofang Qi, Wencheng Ma, Yongkuan Xu, Zhanggui Hu, and Yicheng Wu. Suppression of the Surface Roughness by Adjusting the Temperature Distribution in the Top-seeded Solution Growth of SiC Crystal. Elsevier, 2025.

MLA (9th ed.) Citation

Li, Mengyu, et al. Suppression of the Surface Roughness by Adjusting the Temperature Distribution in the Top-seeded Solution Growth of SiC Crystal. Elsevier, 2025.