Experimental Investigation of Si/SnOx Heterojunction for Its Tunable Optoelectronic Properties

We report growth and characterization of n-Si&#x002F;p-SnO<sub>x</sub> heterojunction using RF sputtering for deposition of p-type SnO<sub>x</sub> under controlled growth oxygen pressure over n-type silicon (Si) wafer. The heterojunction properties of Si&#x002F;SnO<...

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Main Authors: Manoj Kumar, Vivek Kumar Srivastava, M. Sudhakara Reddy, Ram Bharos Yadav, Manoj Sharma, Amrindra Pal, Purnendu Shekhar Pandey, Yadvendra Singh, Gyanendra Kumar Singh, Balkeshwar Singh
Format: Article
Language:English
Published: IEEE 2024-01-01
Series:IEEE Photonics Journal
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Online Access:https://ieeexplore.ieee.org/document/10660480/
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Summary:We report growth and characterization of n-Si&#x002F;p-SnO<sub>x</sub> heterojunction using RF sputtering for deposition of p-type SnO<sub>x</sub> under controlled growth oxygen pressure over n-type silicon (Si) wafer. The heterojunction properties of Si&#x002F;SnO<sub>x</sub> were varied by controlling the growth oxygen pressure of SnOx. Several characterization techniques, including PL (photoluminescence), AFM (atomic force microscopy), FESEM (field emission scanning electron microscopy), XRD, I-V characteristics and Hall measurement, were conducted to analyze the structural, optical, and electrical properties of the n-Si&#x002F;p-SnOx heterojunction. The knee voltage (V<sub>knee</sub>), or cut-in voltage, was calculated by analyzing the gradient of the dark current-voltage (J-V) curves when the bias was applied in the forward direction. The V<sub>knee</sub> values for type-I, type-II, and type-III n-Si&#x002F;p-SnO<sub>x</sub> heterojunctions were determined to be 0.62 V, 0.84 V, and 1.0 V, respectively. The ideality factors (n<sub>1</sub> and n<sub>2</sub>) were determined to be 1.52, 2.22, 3.52, and 8.41, 9.31, 10.34, respectively, for various heterojunction types. The reverse saturation current densities, J<sub>01</sub> and J<sub>02</sub> ranging from approximately 10<sup>&#x2212;7</sup> to 10<sup>&#x2212;6</sup> A&#x002F;cm<sup>2</sup>, and 10<sup>&#x2212;5</sup> to 10<sup>&#x2212;4</sup> A&#x002F;cm<sup>2</sup>, respectively. The objective of this experimental work is to investigate especially, the prospect of silicon &#x002F;metal-oxide (Si&#x002F;SnOx) based heterojunction to be used as optical sensors with tunable optoelectronic properties of SnOx.
ISSN:1943-0655