Validation of Experimental Cooling Performance of Multi-Stage Thin-Film Thermoelectric Devices via Numerical Simulation

In-plane thermoelectric thin-film cooling devices are considered a promising solution for thermal management in electronic systems. However, the actual cooling performance is far below that of regular bulk cooling devices, making the design of thin-film devices much more difficult. In this work, a n...

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Main Authors: Yu Ning, Longzhou Li, Ping Wei, Shaoqiu Ke, Wanting Zhu, Xiaolei Nie, Danqi He, Mingrui Liu, Wenyu Zhao
Format: Article
Language:English
Published: MDPI AG 2025-05-01
Series:Micromachines
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Online Access:https://www.mdpi.com/2072-666X/16/6/648
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author Yu Ning
Longzhou Li
Ping Wei
Shaoqiu Ke
Wanting Zhu
Xiaolei Nie
Danqi He
Mingrui Liu
Wenyu Zhao
author_facet Yu Ning
Longzhou Li
Ping Wei
Shaoqiu Ke
Wanting Zhu
Xiaolei Nie
Danqi He
Mingrui Liu
Wenyu Zhao
author_sort Yu Ning
collection DOAJ
description In-plane thermoelectric thin-film cooling devices are considered a promising solution for thermal management in electronic systems. However, the actual cooling performance is far below that of regular bulk cooling devices, making the design of thin-film devices much more difficult. In this work, a numerical analysis of the cooling performance of single-leg thin-film devices and multi-stage cascaded thin-film devices was conducted to understand the depressed cooling performance. The effects of input current, operating environment, substrate, and contact resistance on cooling performance were investigated and compared with the experimental data. The results show that under ideal conditions, including vacuum environment, absence of substrate, and no contact resistance, the maximum cooling temperature difference simulated by the finite element method (105.4 K) closely matches the theoretical value estimated from the <i>ZT</i>-based calculation (96.6 K). Under practical conditions, such as within atmosphere and with substrate and contact resistance, the simulated maximum temperature difference (2.1 K) fits well with the experimental value (1.1 K). These findings demonstrate that substrate effects, contact resistance, and operating environment can significantly impair the cooling performance of in-plane film thermoelectric devices, although high-performance thermoelectric materials were used. This study provides a guidance for the design and parameter optimization of thermoelectric thin-film cooling modules.
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publishDate 2025-05-01
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spelling doaj-art-d7ee376bf8c34bca9c0eded30a3a07512025-06-25T14:11:28ZengMDPI AGMicromachines2072-666X2025-05-0116664810.3390/mi16060648Validation of Experimental Cooling Performance of Multi-Stage Thin-Film Thermoelectric Devices via Numerical SimulationYu Ning0Longzhou Li1Ping Wei2Shaoqiu Ke3Wanting Zhu4Xiaolei Nie5Danqi He6Mingrui Liu7Wenyu Zhao8State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, ChinaState Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, ChinaState Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, ChinaHubei Key Laboratory of Photoelectric Materials and Devices, School of Materials Science and Engineering, Hubei Normal University, Huangshi 435002, ChinaState Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, ChinaState Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, ChinaState Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, ChinaFoshan Xianhu Laboratory of the Advanced Energy Science and Technology Guangdong Laboratory, Foshan 528000, ChinaState Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, ChinaIn-plane thermoelectric thin-film cooling devices are considered a promising solution for thermal management in electronic systems. However, the actual cooling performance is far below that of regular bulk cooling devices, making the design of thin-film devices much more difficult. In this work, a numerical analysis of the cooling performance of single-leg thin-film devices and multi-stage cascaded thin-film devices was conducted to understand the depressed cooling performance. The effects of input current, operating environment, substrate, and contact resistance on cooling performance were investigated and compared with the experimental data. The results show that under ideal conditions, including vacuum environment, absence of substrate, and no contact resistance, the maximum cooling temperature difference simulated by the finite element method (105.4 K) closely matches the theoretical value estimated from the <i>ZT</i>-based calculation (96.6 K). Under practical conditions, such as within atmosphere and with substrate and contact resistance, the simulated maximum temperature difference (2.1 K) fits well with the experimental value (1.1 K). These findings demonstrate that substrate effects, contact resistance, and operating environment can significantly impair the cooling performance of in-plane film thermoelectric devices, although high-performance thermoelectric materials were used. This study provides a guidance for the design and parameter optimization of thermoelectric thin-film cooling modules.https://www.mdpi.com/2072-666X/16/6/648thermoelectric coolersthin-film devicefinite element simulationcooling temperature difference
spellingShingle Yu Ning
Longzhou Li
Ping Wei
Shaoqiu Ke
Wanting Zhu
Xiaolei Nie
Danqi He
Mingrui Liu
Wenyu Zhao
Validation of Experimental Cooling Performance of Multi-Stage Thin-Film Thermoelectric Devices via Numerical Simulation
Micromachines
thermoelectric coolers
thin-film device
finite element simulation
cooling temperature difference
title Validation of Experimental Cooling Performance of Multi-Stage Thin-Film Thermoelectric Devices via Numerical Simulation
title_full Validation of Experimental Cooling Performance of Multi-Stage Thin-Film Thermoelectric Devices via Numerical Simulation
title_fullStr Validation of Experimental Cooling Performance of Multi-Stage Thin-Film Thermoelectric Devices via Numerical Simulation
title_full_unstemmed Validation of Experimental Cooling Performance of Multi-Stage Thin-Film Thermoelectric Devices via Numerical Simulation
title_short Validation of Experimental Cooling Performance of Multi-Stage Thin-Film Thermoelectric Devices via Numerical Simulation
title_sort validation of experimental cooling performance of multi stage thin film thermoelectric devices via numerical simulation
topic thermoelectric coolers
thin-film device
finite element simulation
cooling temperature difference
url https://www.mdpi.com/2072-666X/16/6/648
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