High Reflectivity YDH/SiO2 Distributed Bragg Reflector for UV-C Wavelength Regime
A distributed Bragg reflector (DBR) composed of Y<sub>2</sub>O<sub>3</sub>-doped HfO<sub>2</sub> (YDH)/SiO<sub>2</sub> layers with high reflectivity spectrum centered at a wavelength of ∼240 nm is fabricated using radio-frequency...
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2018-01-01
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author | Mohd Sharizal Alias Abdullah A. Alatawi Wong Kim Chong Malleswararao Tangi Jorge A. Holguin-Lerma Edgars Stegenburgs Mohammad Khaled Shakfa Tien Khee Ng Abdulrahman M. Albadri Ahmed Y. Alyamani Boon S. Ooi |
author_facet | Mohd Sharizal Alias Abdullah A. Alatawi Wong Kim Chong Malleswararao Tangi Jorge A. Holguin-Lerma Edgars Stegenburgs Mohammad Khaled Shakfa Tien Khee Ng Abdulrahman M. Albadri Ahmed Y. Alyamani Boon S. Ooi |
author_sort | Mohd Sharizal Alias |
collection | DOAJ |
description | A distributed Bragg reflector (DBR) composed of Y<sub>2</sub>O<sub>3</sub>-doped HfO<sub>2</sub> (YDH)/SiO<sub>2</sub> layers with high reflectivity spectrum centered at a wavelength of ∼240 nm is fabricated using radio-frequency magnetron sputtering. Before the DBR deposition, optical properties for a single layer of YDH, SiO<sub>2</sub>, and HfO<sub>2</sub> thin films were studied using spectroscopic ellipsometry and spectrophotometry. To investigate the performance of YDH as a material for the high refractive index layer in the DBR, a comparison of its optical properties was made with HfO<sub>2</sub> thin films. Due to larger optical bandgap, the YDH thin films demonstrated higher transparency, lower extinction coefficient, and lower absorption coefficient in the UV-C regime (especially for wavelengths below 250 nm) compared to the HfO<sub>2</sub> thin films. The fabricated YDH/SiO<sub>2 </sub> DBR consisting of 15 periods achieved a reflectivity higher than 99.9% at the wavelength of ∼240 nm with a stopband of ∼50 nm. The high reflectivity and broad stopband of YDH/SiO<sub>2</sub> DBRs will enable further advancement of various photonic devices such as vertical-cavity surface-emitting lasers, resonant-cavity light-emitting diodes, and resonant-cavity photodetectors operating in the UV-C wavelength regime. |
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language | English |
publishDate | 2018-01-01 |
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series | IEEE Photonics Journal |
spelling | doaj-art-d0ea9d5e5d3949bf8d2f3f0bf4ffe0782025-07-01T23:37:22ZengIEEEIEEE Photonics Journal1943-06552018-01-011021810.1109/JPHOT.2018.28043558290666High Reflectivity YDH/SiO2 Distributed Bragg Reflector for UV-C Wavelength RegimeMohd Sharizal Alias0https://orcid.org/0000-0003-1369-1421Abdullah A. Alatawi1https://orcid.org/0000-0002-1393-1678Wong Kim Chong2Malleswararao Tangi3Jorge A. Holguin-Lerma4https://orcid.org/0000-0003-0138-9073Edgars Stegenburgs5https://orcid.org/0000-0003-0156-5487Mohammad Khaled Shakfa6https://orcid.org/0000-0002-0442-8843Tien Khee Ng7https://orcid.org/0000-0002-1480-6975Abdulrahman M. Albadri8Ahmed Y. Alyamani9Boon S. Ooi10https://orcid.org/0000-0001-9606-5578Photonics Laboratory, Computer, Electrical and Mathematical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal, Saudi ArabiaPhotonics Laboratory, Computer, Electrical and Mathematical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal, Saudi ArabiaCore Labs, King Abdullah University of Science and Technology, Thuwal, Saudi ArabiaPhotonics Laboratory, Computer, Electrical and Mathematical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal, Saudi ArabiaPhotonics Laboratory, Computer, Electrical and Mathematical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal, Saudi ArabiaPhotonics Laboratory, Computer, Electrical and Mathematical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal, Saudi ArabiaPhotonics Laboratory, Computer, Electrical and Mathematical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal, Saudi ArabiaPhotonics Laboratory, Computer, Electrical and Mathematical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal, Saudi ArabiaNational Center for Nanotechnology, King Abdulaziz City for Science and Technology, Riyadh, Saudi ArabiaNational Center for Nanotechnology, King Abdulaziz City for Science and Technology, Riyadh, Saudi ArabiaPhotonics Laboratory, Computer, Electrical and Mathematical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal, Saudi ArabiaA distributed Bragg reflector (DBR) composed of Y<sub>2</sub>O<sub>3</sub>-doped HfO<sub>2</sub> (YDH)/SiO<sub>2</sub> layers with high reflectivity spectrum centered at a wavelength of ∼240 nm is fabricated using radio-frequency magnetron sputtering. Before the DBR deposition, optical properties for a single layer of YDH, SiO<sub>2</sub>, and HfO<sub>2</sub> thin films were studied using spectroscopic ellipsometry and spectrophotometry. To investigate the performance of YDH as a material for the high refractive index layer in the DBR, a comparison of its optical properties was made with HfO<sub>2</sub> thin films. Due to larger optical bandgap, the YDH thin films demonstrated higher transparency, lower extinction coefficient, and lower absorption coefficient in the UV-C regime (especially for wavelengths below 250 nm) compared to the HfO<sub>2</sub> thin films. The fabricated YDH/SiO<sub>2 </sub> DBR consisting of 15 periods achieved a reflectivity higher than 99.9% at the wavelength of ∼240 nm with a stopband of ∼50 nm. The high reflectivity and broad stopband of YDH/SiO<sub>2</sub> DBRs will enable further advancement of various photonic devices such as vertical-cavity surface-emitting lasers, resonant-cavity light-emitting diodes, and resonant-cavity photodetectors operating in the UV-C wavelength regime.https://ieeexplore.ieee.org/document/8290666/Distributed Bragg reflectorthin filmsultraviolet. |
spellingShingle | Mohd Sharizal Alias Abdullah A. Alatawi Wong Kim Chong Malleswararao Tangi Jorge A. Holguin-Lerma Edgars Stegenburgs Mohammad Khaled Shakfa Tien Khee Ng Abdulrahman M. Albadri Ahmed Y. Alyamani Boon S. Ooi High Reflectivity YDH/SiO2 Distributed Bragg Reflector for UV-C Wavelength Regime IEEE Photonics Journal Distributed Bragg reflector thin films ultraviolet. |
title | High Reflectivity YDH/SiO2 Distributed Bragg Reflector for UV-C Wavelength Regime |
title_full | High Reflectivity YDH/SiO2 Distributed Bragg Reflector for UV-C Wavelength Regime |
title_fullStr | High Reflectivity YDH/SiO2 Distributed Bragg Reflector for UV-C Wavelength Regime |
title_full_unstemmed | High Reflectivity YDH/SiO2 Distributed Bragg Reflector for UV-C Wavelength Regime |
title_short | High Reflectivity YDH/SiO2 Distributed Bragg Reflector for UV-C Wavelength Regime |
title_sort | high reflectivity ydh sio2 distributed bragg reflector for uv c wavelength regime |
topic | Distributed Bragg reflector thin films ultraviolet. |
url | https://ieeexplore.ieee.org/document/8290666/ |
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