High Reflectivity YDH/SiO2 Distributed Bragg Reflector for UV-C Wavelength Regime

A distributed Bragg reflector (DBR) composed of Y<sub>2</sub>O<sub>3</sub>-doped HfO<sub>2</sub> (YDH)&#x002F;SiO<sub>2</sub> layers with high reflectivity spectrum centered at a wavelength of &#x223C;240 nm is fabricated using radio-frequency...

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Main Authors: Mohd Sharizal Alias, Abdullah A. Alatawi, Wong Kim Chong, Malleswararao Tangi, Jorge A. Holguin-Lerma, Edgars Stegenburgs, Mohammad Khaled Shakfa, Tien Khee Ng, Abdulrahman M. Albadri, Ahmed Y. Alyamani, Boon S. Ooi
Format: Article
Language:English
Published: IEEE 2018-01-01
Series:IEEE Photonics Journal
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Online Access:https://ieeexplore.ieee.org/document/8290666/
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author Mohd Sharizal Alias
Abdullah A. Alatawi
Wong Kim Chong
Malleswararao Tangi
Jorge A. Holguin-Lerma
Edgars Stegenburgs
Mohammad Khaled Shakfa
Tien Khee Ng
Abdulrahman M. Albadri
Ahmed Y. Alyamani
Boon S. Ooi
author_facet Mohd Sharizal Alias
Abdullah A. Alatawi
Wong Kim Chong
Malleswararao Tangi
Jorge A. Holguin-Lerma
Edgars Stegenburgs
Mohammad Khaled Shakfa
Tien Khee Ng
Abdulrahman M. Albadri
Ahmed Y. Alyamani
Boon S. Ooi
author_sort Mohd Sharizal Alias
collection DOAJ
description A distributed Bragg reflector (DBR) composed of Y<sub>2</sub>O<sub>3</sub>-doped HfO<sub>2</sub> (YDH)&#x002F;SiO<sub>2</sub> layers with high reflectivity spectrum centered at a wavelength of &#x223C;240 nm is fabricated using radio-frequency magnetron sputtering. Before the DBR deposition, optical properties for a single layer of YDH, SiO<sub>2</sub>, and HfO<sub>2</sub> thin films were studied using spectroscopic ellipsometry and spectrophotometry. To investigate the performance of YDH as a material for the high refractive index layer in the DBR, a comparison of its optical properties was made with HfO<sub>2</sub> thin films. Due to larger optical bandgap, the YDH thin films demonstrated higher transparency, lower extinction coefficient, and lower absorption coefficient in the UV-C regime (especially for wavelengths below 250 nm) compared to the HfO<sub>2</sub> thin films. The fabricated YDH&#x002F;SiO<sub>2 </sub> DBR consisting of 15 periods achieved a reflectivity higher than 99.9&#x0025; at the wavelength of &#x223C;240 nm with a stopband of &#x223C;50 nm. The high reflectivity and broad stopband of YDH&#x002F;SiO<sub>2</sub> DBRs will enable further advancement of various photonic devices such as vertical-cavity surface-emitting lasers, resonant-cavity light-emitting diodes, and resonant-cavity photodetectors operating in the UV-C wavelength regime.
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spelling doaj-art-d0ea9d5e5d3949bf8d2f3f0bf4ffe0782025-07-01T23:37:22ZengIEEEIEEE Photonics Journal1943-06552018-01-011021810.1109/JPHOT.2018.28043558290666High Reflectivity YDH/SiO2 Distributed Bragg Reflector for UV-C Wavelength RegimeMohd Sharizal Alias0https://orcid.org/0000-0003-1369-1421Abdullah A. Alatawi1https://orcid.org/0000-0002-1393-1678Wong Kim Chong2Malleswararao Tangi3Jorge A. Holguin-Lerma4https://orcid.org/0000-0003-0138-9073Edgars Stegenburgs5https://orcid.org/0000-0003-0156-5487Mohammad Khaled Shakfa6https://orcid.org/0000-0002-0442-8843Tien Khee Ng7https://orcid.org/0000-0002-1480-6975Abdulrahman M. Albadri8Ahmed Y. Alyamani9Boon S. Ooi10https://orcid.org/0000-0001-9606-5578Photonics Laboratory, Computer, Electrical and Mathematical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal, Saudi ArabiaPhotonics Laboratory, Computer, Electrical and Mathematical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal, Saudi ArabiaCore Labs, King Abdullah University of Science and Technology, Thuwal, Saudi ArabiaPhotonics Laboratory, Computer, Electrical and Mathematical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal, Saudi ArabiaPhotonics Laboratory, Computer, Electrical and Mathematical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal, Saudi ArabiaPhotonics Laboratory, Computer, Electrical and Mathematical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal, Saudi ArabiaPhotonics Laboratory, Computer, Electrical and Mathematical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal, Saudi ArabiaPhotonics Laboratory, Computer, Electrical and Mathematical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal, Saudi ArabiaNational Center for Nanotechnology, King Abdulaziz City for Science and Technology, Riyadh, Saudi ArabiaNational Center for Nanotechnology, King Abdulaziz City for Science and Technology, Riyadh, Saudi ArabiaPhotonics Laboratory, Computer, Electrical and Mathematical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal, Saudi ArabiaA distributed Bragg reflector (DBR) composed of Y<sub>2</sub>O<sub>3</sub>-doped HfO<sub>2</sub> (YDH)&#x002F;SiO<sub>2</sub> layers with high reflectivity spectrum centered at a wavelength of &#x223C;240 nm is fabricated using radio-frequency magnetron sputtering. Before the DBR deposition, optical properties for a single layer of YDH, SiO<sub>2</sub>, and HfO<sub>2</sub> thin films were studied using spectroscopic ellipsometry and spectrophotometry. To investigate the performance of YDH as a material for the high refractive index layer in the DBR, a comparison of its optical properties was made with HfO<sub>2</sub> thin films. Due to larger optical bandgap, the YDH thin films demonstrated higher transparency, lower extinction coefficient, and lower absorption coefficient in the UV-C regime (especially for wavelengths below 250 nm) compared to the HfO<sub>2</sub> thin films. The fabricated YDH&#x002F;SiO<sub>2 </sub> DBR consisting of 15 periods achieved a reflectivity higher than 99.9&#x0025; at the wavelength of &#x223C;240 nm with a stopband of &#x223C;50 nm. The high reflectivity and broad stopband of YDH&#x002F;SiO<sub>2</sub> DBRs will enable further advancement of various photonic devices such as vertical-cavity surface-emitting lasers, resonant-cavity light-emitting diodes, and resonant-cavity photodetectors operating in the UV-C wavelength regime.https://ieeexplore.ieee.org/document/8290666/Distributed Bragg reflectorthin filmsultraviolet.
spellingShingle Mohd Sharizal Alias
Abdullah A. Alatawi
Wong Kim Chong
Malleswararao Tangi
Jorge A. Holguin-Lerma
Edgars Stegenburgs
Mohammad Khaled Shakfa
Tien Khee Ng
Abdulrahman M. Albadri
Ahmed Y. Alyamani
Boon S. Ooi
High Reflectivity YDH/SiO2 Distributed Bragg Reflector for UV-C Wavelength Regime
IEEE Photonics Journal
Distributed Bragg reflector
thin films
ultraviolet.
title High Reflectivity YDH/SiO2 Distributed Bragg Reflector for UV-C Wavelength Regime
title_full High Reflectivity YDH/SiO2 Distributed Bragg Reflector for UV-C Wavelength Regime
title_fullStr High Reflectivity YDH/SiO2 Distributed Bragg Reflector for UV-C Wavelength Regime
title_full_unstemmed High Reflectivity YDH/SiO2 Distributed Bragg Reflector for UV-C Wavelength Regime
title_short High Reflectivity YDH/SiO2 Distributed Bragg Reflector for UV-C Wavelength Regime
title_sort high reflectivity ydh sio2 distributed bragg reflector for uv c wavelength regime
topic Distributed Bragg reflector
thin films
ultraviolet.
url https://ieeexplore.ieee.org/document/8290666/
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