Application of Technical Gases and Their Families in Modern Industrial Technologies: A Review
The aim of the study is to review the use of gas products of natural and synthetic origin and their future application prospects. To achieve this goal, a number of high-tech technologies were pre-sented and analysed. The phase equilibrium parameters of inert and fluorine-containing gases were shown,...
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| Format: | Article |
| Language: | English |
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Academy of Sciences of Moldova
2024-07-01
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| Series: | Problems of the Regional Energetics |
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| Online Access: | https://journal.ie.asm.md/assets/files/09_03_63_2024.pdf |
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| author | Simonenko Iu.M. Hrudka B.H. Chyhrin A.A. Kostenko Ye.V. |
| author_facet | Simonenko Iu.M. Hrudka B.H. Chyhrin A.A. Kostenko Ye.V. |
| author_sort | Simonenko Iu.M. |
| collection | DOAJ |
| description | The aim of the study is to review the use of gas products of natural and synthetic origin and their future application prospects. To achieve this goal, a number of high-tech technologies were pre-sented and analysed. The phase equilibrium parameters of inert and fluorine-containing gases were shown, as well as the temperature ranges in which certain refrigerants can be applied. Ex-amples of cooler schemes for providing rectification processes at 28 and 210 K were given. The processes of refrigeration cycles in T-s diagrams of neon and R116 (hexafluoroethane) were shown. Schemes of helium systems for heat removal at the level of 5…28 K were considered. The areas of application of Xe, Kr, Ne, and He in modern technologies, particularly in laser technology, space exploration, lamp industry, and medicine, were highlighted. The most signifi-cant result of the work is the determination of the important role of isotopic components of inert gases for the future of energy, functional diagnostics, metrology, and other fields. In semicon-ductor manufacturing, many inert gases are used as protective environments and working media in ion-plasma and ion-beam etching in vacuum chambers. In plasma chemical surface treatment, substances containing one or more halogen atoms act as active gases. The significance of the results achieved is evident in that, in the context of a global shortage of technical gases, the de-velopment of resource-saving technologies is becoming relevant. Among these, gas product re-cycling, where gas concentrates were obtained from used mixtures, enriched, and subjected to deep purification for the secondary use of target products, is the most promising. |
| format | Article |
| id | doaj-art-c7d1df3fe23e41749b35a2f33963a9f8 |
| institution | Matheson Library |
| issn | 1857-0070 |
| language | English |
| publishDate | 2024-07-01 |
| publisher | Academy of Sciences of Moldova |
| record_format | Article |
| series | Problems of the Regional Energetics |
| spelling | doaj-art-c7d1df3fe23e41749b35a2f33963a9f82025-08-02T19:10:35ZengAcademy of Sciences of MoldovaProblems of the Regional Energetics1857-00702024-07-0163310411710.52254/1857-0070.2024.3-63.09Application of Technical Gases and Their Families in Modern Industrial Technologies: A ReviewSimonenko Iu.M.0Hrudka B.H.1Chyhrin A.A.2Kostenko Ye.V.3Odessa National University of Technology, Odessa, UkraineOdessa National University of Technology, Odessa, UkraineCryoin Europe, RomaniaOdessa National University of Technology, Odessa, UkraineThe aim of the study is to review the use of gas products of natural and synthetic origin and their future application prospects. To achieve this goal, a number of high-tech technologies were pre-sented and analysed. The phase equilibrium parameters of inert and fluorine-containing gases were shown, as well as the temperature ranges in which certain refrigerants can be applied. Ex-amples of cooler schemes for providing rectification processes at 28 and 210 K were given. The processes of refrigeration cycles in T-s diagrams of neon and R116 (hexafluoroethane) were shown. Schemes of helium systems for heat removal at the level of 5…28 K were considered. The areas of application of Xe, Kr, Ne, and He in modern technologies, particularly in laser technology, space exploration, lamp industry, and medicine, were highlighted. The most signifi-cant result of the work is the determination of the important role of isotopic components of inert gases for the future of energy, functional diagnostics, metrology, and other fields. In semicon-ductor manufacturing, many inert gases are used as protective environments and working media in ion-plasma and ion-beam etching in vacuum chambers. In plasma chemical surface treatment, substances containing one or more halogen atoms act as active gases. The significance of the results achieved is evident in that, in the context of a global shortage of technical gases, the de-velopment of resource-saving technologies is becoming relevant. Among these, gas product re-cycling, where gas concentrates were obtained from used mixtures, enriched, and subjected to deep purification for the secondary use of target products, is the most promising. https://journal.ie.asm.md/assets/files/09_03_63_2024.pdftechnical gasesrefrigerantsrefrigeration cyclerefrigeratorion enginestable isotopesion etch-ing of semiconductorsplasma chemical process. |
| spellingShingle | Simonenko Iu.M. Hrudka B.H. Chyhrin A.A. Kostenko Ye.V. Application of Technical Gases and Their Families in Modern Industrial Technologies: A Review Problems of the Regional Energetics technical gases refrigerants refrigeration cycle refrigerator ion engine stable isotopes ion etch-ing of semiconductors plasma chemical process. |
| title | Application of Technical Gases and Their Families in Modern Industrial Technologies: A Review |
| title_full | Application of Technical Gases and Their Families in Modern Industrial Technologies: A Review |
| title_fullStr | Application of Technical Gases and Their Families in Modern Industrial Technologies: A Review |
| title_full_unstemmed | Application of Technical Gases and Their Families in Modern Industrial Technologies: A Review |
| title_short | Application of Technical Gases and Their Families in Modern Industrial Technologies: A Review |
| title_sort | application of technical gases and their families in modern industrial technologies a review |
| topic | technical gases refrigerants refrigeration cycle refrigerator ion engine stable isotopes ion etch-ing of semiconductors plasma chemical process. |
| url | https://journal.ie.asm.md/assets/files/09_03_63_2024.pdf |
| work_keys_str_mv | AT simonenkoium applicationoftechnicalgasesandtheirfamiliesinmodernindustrialtechnologiesareview AT hrudkabh applicationoftechnicalgasesandtheirfamiliesinmodernindustrialtechnologiesareview AT chyhrinaa applicationoftechnicalgasesandtheirfamiliesinmodernindustrialtechnologiesareview AT kostenkoyev applicationoftechnicalgasesandtheirfamiliesinmodernindustrialtechnologiesareview |