A Hierarchical Inverse Lithography Method Considering the Optimization and Manufacturability Limit by Gradient Descent
Inverse lithography technology (ILT) based on the gradient descent (GD) algorithm, which is a classical local optimal method, can effectively improve the lithographic imaging fidelity. However, due to the low-pass filtering effect of the lithography imaging system, GD, although able to converge quic...
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| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2025-07-01
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| Series: | Micromachines |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2072-666X/16/7/798 |
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