APA (7th ed.) Citation

Wang, Y., Li, J., Zhu, H., Bu, H., Du, X., Shen, S., . . . Li, X. (2025). Simultaneously achieving high-κ and strong ferroelectricity in Hf0.5Zr0.5O2 thin film by structural stacking design. Elsevier.

Chicago Style (17th ed.) Citation

Wang, Yuchen, Jiachen Li, Hansheng Zhu, Haifeng Bu, Xinzhe Du, Shengchun Shen, Yuewei Yin, and Xiaoguang Li. Simultaneously Achieving High-κ and Strong Ferroelectricity in Hf0.5Zr0.5O2 Thin Film by Structural Stacking Design. Elsevier, 2025.

MLA (9th ed.) Citation

Wang, Yuchen, et al. Simultaneously Achieving High-κ and Strong Ferroelectricity in Hf0.5Zr0.5O2 Thin Film by Structural Stacking Design. Elsevier, 2025.