Plasmonic Stripes in Aqueous Environment Co-Integrated With Si3N4 Photonics
We demonstrate the design, fabrication, and the experimental characterization of gold-based plasmonic stripes butt-coupled with low-pressure-chemical-vapor-deposition (LPCVD)-based Si<sub>3</sub>N<sub>4</sub> waveguides for the excitation of surface-plasmon-polariton (SPP) mo...
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Main Authors: | , , , , , , , , , , |
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Format: | Article |
Language: | English |
Published: |
IEEE
2018-01-01
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Series: | IEEE Photonics Journal |
Subjects: | |
Online Access: | https://ieeexplore.ieee.org/document/8255556/ |
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Summary: | We demonstrate the design, fabrication, and the experimental characterization of gold-based plasmonic stripes butt-coupled with low-pressure-chemical-vapor-deposition (LPCVD)-based Si<sub>3</sub>N<sub>4</sub> waveguides for the excitation of surface-plasmon-polariton (SPP) modes in aqueous environment. Plasmonic gold stripes, in aqueous environment, with cross-sectional dimensions of 100 nm × 7 <italic>μ</italic>m were interfaced with 360 nm × 800 nm Si<sub>3</sub>N<sub>4</sub> waveguides cladded with low-temperature-oxide, exploiting linear photonic tapers with appropriate vertical (VO) and longitudinal (LO) offsets between the plasmonic and photonic waveguide facets. An interface insertion loss of 2.3 ± 0.3 dB and a plasmonic propagation length ( <inline-formula><tex-math notation="LaTeX">$L_{{\rm{spp}}}$</tex-math></inline-formula>) of 75 <italic>μ </italic>m have been experimentally measured at 1.55 <italic>μ</italic>m for a VO of 400 nm and an LO of 500 nm, with simulation results suggesting high tolerance to VO and LO misalignment errors. The proposed integration approach enables seamless co-integration of plasmonic stripes, in aqueous environment, with a low-loss and low-cost LPCVD-based Si<sub>3</sub>N<sub>4</sub> waveguide platform, revealing its strong potential for future employment in biochemical sensing applications. |
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ISSN: | 1943-0655 |