Plasmonic Stripes in Aqueous Environment Co-Integrated With Si3N4 Photonics

We demonstrate the design, fabrication, and the experimental characterization of gold-based plasmonic stripes butt-coupled with low-pressure-chemical-vapor-deposition (LPCVD)-based Si<sub>3</sub>N<sub>4</sub> waveguides for the excitation of surface-plasmon-polariton (SPP) mo...

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Bibliographic Details
Main Authors: George Dabos, Dimitra Ketzaki, Athanasios Manolis, Laurent Markey, Jean Claude Weeber, Alain Dereux, Anna Lena Giesecke, Caroline Porschatis, Bartos Chmielak, Dimitris Tsiokos, Nikos Pleros
Format: Article
Language:English
Published: IEEE 2018-01-01
Series:IEEE Photonics Journal
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Online Access:https://ieeexplore.ieee.org/document/8255556/
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Summary:We demonstrate the design, fabrication, and the experimental characterization of gold-based plasmonic stripes butt-coupled with low-pressure-chemical-vapor-deposition (LPCVD)-based Si<sub>3</sub>N<sub>4</sub> waveguides for the excitation of surface-plasmon-polariton (SPP) modes in aqueous environment. Plasmonic gold stripes, in aqueous environment, with cross-sectional dimensions of 100&#x00A0;nm &#x00D7; 7&#x00A0;<italic>&#x03BC;</italic>m were interfaced with 360&#x00A0;nm &#x00D7; 800&#x00A0;nm Si<sub>3</sub>N<sub>4</sub> waveguides cladded with low-temperature-oxide, exploiting linear photonic tapers with appropriate vertical (VO) and longitudinal (LO) offsets between the plasmonic and photonic waveguide facets. An interface insertion loss of 2.3 &#x00B1; 0.3&#x00A0;dB and a plasmonic propagation length ( <inline-formula><tex-math notation="LaTeX">$L_{{\rm{spp}}}$</tex-math></inline-formula>) of 75&#x00A0;<italic>&#x03BC; </italic>m have been experimentally measured at 1.55&#x00A0;<italic>&#x03BC;</italic>m for a VO of 400&#x00A0;nm and an LO of 500&#x00A0;nm, with simulation results suggesting high tolerance to VO and LO misalignment errors. The proposed integration approach enables seamless co-integration of plasmonic stripes, in aqueous environment, with a low-loss and low-cost LPCVD-based Si<sub>3</sub>N<sub>4</sub> waveguide platform, revealing its strong potential for future employment in biochemical sensing applications.
ISSN:1943-0655