Design and Analysis of a Graded-Index Strained Si<inline-formula><tex-math notation="LaTeX">$_{1-x}$ </tex-math></inline-formula>Ge<inline-formula><tex-math notation="LaTeX">$_x$</tex-math></inline-formula> Optical PN Phase Shifter
In this paper, a graded-index strained Si<inline-formula><tex-math notation="LaTeX">$_{1-x}$</tex-math> </inline-formula>Ge<inline-formula><tex-math notation="LaTeX">$_x$</tex-math></inline-formula> optical PN phase shifter with mul...
Saved in:
Main Authors: | , |
---|---|
Format: | Article |
Language: | English |
Published: |
IEEE
2018-01-01
|
Series: | IEEE Photonics Journal |
Subjects: | |
Online Access: | https://ieeexplore.ieee.org/document/8528355/ |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Summary: | In this paper, a graded-index strained Si<inline-formula><tex-math notation="LaTeX">$_{1-x}$</tex-math> </inline-formula>Ge<inline-formula><tex-math notation="LaTeX">$_x$</tex-math></inline-formula> optical PN phase shifter with multiple strained layers has been proposed for high speed data modulation at 1550 nm with low device footprint. The quasi-vectorial finite difference method, non-local empirical pseudopotential method and the Payne-Lacey model has been used to analyze the proposed device. A phase shift of 122<inline-formula> <tex-math notation="LaTeX">$^\circ$</tex-math></inline-formula>/mm, V<inline-formula><tex-math notation="LaTeX">$_\pi$ </tex-math></inline-formula>L<inline-formula><tex-math notation="LaTeX">$_\pi$</tex-math></inline-formula> of 0.74 V.cm, and insertion loss of 4 dB at 5 V reverse bias with a 3-dB modulation bandwidth of 27.5 GHz has been obtained for a 500 nm × 250 nm cross-section rib waveguide with 50 nm slab. A 15 <inline-formula><tex-math notation="LaTeX">$^\circ$</tex-math></inline-formula>/mm increase in phase shift and 0.08 V.cm decrease in V<inline-formula><tex-math notation="LaTeX">$_\pi$</tex-math></inline-formula>L <inline-formula><tex-math notation="LaTeX">$_\pi$</tex-math></inline-formula> has been observed when the junction is shifted by 60 nm towards the N side. |
---|---|
ISSN: | 1943-0655 |