Coulomb Heating Behaviour of Fast Light Diclusters in Si<100> Direction
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| Main Authors: | , , |
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| Format: | Electronic Book Chapter |
| Language: | English |
| Published: |
IntechOpen
2012
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| Subjects: | |
| Online Access: | https://www.intechopen.com/chapters/37185 |
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| _version_ | 1839566053705777152 |
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| author | Fadanelli, R. C. Behar, M. Dias, J. F. |
| author_facet | Fadanelli, R. C. Behar, M. Dias, J. F. |
| author_sort | Fadanelli, R. C. |
| collection | InTech Open eBooks |
| description | None |
| doi_str_mv | 10.5772/35696 |
| first_indexed | 2025-08-04T22:34:58Z |
| format | Electronic Book Chapter |
| fullrecord | <oai_dc:dc xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd"><identifier>InTech-37185</identifier><datestamp>2012-05-30</datestamp>
<dc:title>Coulomb Heating Behaviour of Fast Light Diclusters in Si<100> Direction</dc:title>
<dc:creator>R. C. Fadanelli</dc:creator>
<dc:creator>M. Behar</dc:creator>
<dc:creator>J. F. Dias</dc:creator>
<dc:subject>Physical Sciences, Engineering and Technology</dc:subject>
<dc:description>None</dc:description>
<dc:publisher>IntechOpen</dc:publisher>
<dc:date>2012-05-30</dc:date>
<dc:type>Chapter, Part Of Book</dc:type>
<dc:identifier>https://www.intechopen.com/chapters/37185</dc:identifier>
<dc:identifier>doi:10.5772/35696</dc:identifier>
<dc:language>en</dc:language>
<dc:relation>ISBN:978-953-51-0634-0</dc:relation>
<dc:rights>https://creativecommons.org/licenses/by/3.0/</dc:rights>
<dc:source>https://www.intechopen.com/books/1421 ; Ion Implantation</dc:source>
</oai_dc:dc> |
| id | InTech-37185 |
| institution | Matheson Library |
| isbn | 978-953-51-0634-0 |
| language | English |
| last_indexed | 2025-08-04T22:34:58Z |
| publishDate | 2012 |
| publisher | IntechOpen |
| record_format | intech |
| spelling | InTech-371852012-05-30 Coulomb Heating Behaviour of Fast Light Diclusters in Si<100> Direction R. C. Fadanelli M. Behar J. F. Dias Physical Sciences, Engineering and Technology None IntechOpen 2012-05-30 Chapter, Part Of Book https://www.intechopen.com/chapters/37185 doi:10.5772/35696 en ISBN:978-953-51-0634-0 https://creativecommons.org/licenses/by/3.0/ https://www.intechopen.com/books/1421 ; Ion Implantation |
| spellingShingle | Physical Sciences, Engineering and Technology Fadanelli, R. C. Behar, M. Dias, J. F. Coulomb Heating Behaviour of Fast Light Diclusters in Si<100> Direction |
| title | Coulomb Heating Behaviour of Fast Light Diclusters in Si<100> Direction |
| title_full | Coulomb Heating Behaviour of Fast Light Diclusters in Si<100> Direction |
| title_fullStr | Coulomb Heating Behaviour of Fast Light Diclusters in Si<100> Direction |
| title_full_unstemmed | Coulomb Heating Behaviour of Fast Light Diclusters in Si<100> Direction |
| title_short | Coulomb Heating Behaviour of Fast Light Diclusters in Si<100> Direction |
| title_sort | coulomb heating behaviour of fast light diclusters in si 100 direction |
| topic | Physical Sciences, Engineering and Technology |
| url | https://www.intechopen.com/chapters/37185 |
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