A Systematic Study and Characterization of Advanced Corrosion Resistance Materials and Their Applications for Plasma Etching Processes in Semiconductor Silicon Wafer Fabrication

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Main Author: Shih, Hong
Format: Electronic Book Chapter
Language:English
Published: IntechOpen 2012
Subjects:
Online Access:https://www.intechopen.com/chapters/34479
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author Shih, Hong
author_facet Shih, Hong
author_sort Shih, Hong
collection InTech Open eBooks
description None
doi_str_mv 10.5772/31992
first_indexed 2025-08-04T22:33:48Z
format Electronic
Book Chapter
fullrecord <oai_dc:dc xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd"><identifier>InTech-34479</identifier><datestamp>2012-03-30</datestamp> <dc:title>A Systematic Study and Characterization of Advanced Corrosion Resistance Materials and Their Applications for Plasma Etching Processes in Semiconductor Silicon Wafer Fabrication</dc:title> <dc:creator>Hong Shih</dc:creator> <dc:subject>Physical Sciences, Engineering and Technology</dc:subject> <dc:description>None</dc:description> <dc:publisher>IntechOpen</dc:publisher> <dc:date>2012-03-30</dc:date> <dc:type>Chapter, Part Of Book</dc:type> <dc:identifier>https://www.intechopen.com/chapters/34479</dc:identifier> <dc:identifier>doi:10.5772/31992</dc:identifier> <dc:language>en</dc:language> <dc:relation>ISBN:978-953-51-0467-4</dc:relation> <dc:rights>https://creativecommons.org/licenses/by/3.0/</dc:rights> <dc:source>https://www.intechopen.com/books/1380 ; Corrosion Resistance</dc:source> </oai_dc:dc>
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institution Matheson Library
isbn 978-953-51-0467-4
language English
last_indexed 2025-08-04T22:33:48Z
publishDate 2012
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spelling InTech-344792012-03-30 A Systematic Study and Characterization of Advanced Corrosion Resistance Materials and Their Applications for Plasma Etching Processes in Semiconductor Silicon Wafer Fabrication Hong Shih Physical Sciences, Engineering and Technology None IntechOpen 2012-03-30 Chapter, Part Of Book https://www.intechopen.com/chapters/34479 doi:10.5772/31992 en ISBN:978-953-51-0467-4 https://creativecommons.org/licenses/by/3.0/ https://www.intechopen.com/books/1380 ; Corrosion Resistance
spellingShingle Physical Sciences, Engineering and Technology
Shih, Hong
A Systematic Study and Characterization of Advanced Corrosion Resistance Materials and Their Applications for Plasma Etching Processes in Semiconductor Silicon Wafer Fabrication
title A Systematic Study and Characterization of Advanced Corrosion Resistance Materials and Their Applications for Plasma Etching Processes in Semiconductor Silicon Wafer Fabrication
title_full A Systematic Study and Characterization of Advanced Corrosion Resistance Materials and Their Applications for Plasma Etching Processes in Semiconductor Silicon Wafer Fabrication
title_fullStr A Systematic Study and Characterization of Advanced Corrosion Resistance Materials and Their Applications for Plasma Etching Processes in Semiconductor Silicon Wafer Fabrication
title_full_unstemmed A Systematic Study and Characterization of Advanced Corrosion Resistance Materials and Their Applications for Plasma Etching Processes in Semiconductor Silicon Wafer Fabrication
title_short A Systematic Study and Characterization of Advanced Corrosion Resistance Materials and Their Applications for Plasma Etching Processes in Semiconductor Silicon Wafer Fabrication
title_sort systematic study and characterization of advanced corrosion resistance materials and their applications for plasma etching processes in semiconductor silicon wafer fabrication
topic Physical Sciences, Engineering and Technology
url https://www.intechopen.com/chapters/34479
work_keys_str_mv AT shihhong asystematicstudyandcharacterizationofadvancedcorrosionresistancematerialsandtheirapplicationsforplasmaetchingprocessesinsemiconductorsiliconwaferfabrication
AT shihhong systematicstudyandcharacterizationofadvancedcorrosionresistancematerialsandtheirapplicationsforplasmaetchingprocessesinsemiconductorsiliconwaferfabrication