Shih, H. (2012). A Systematic Study and Characterization of Advanced Corrosion Resistance Materials and Their Applications for Plasma Etching Processes in Semiconductor Silicon Wafer Fabrication. IntechOpen. https://doi.org/10.5772/31992
Chicago Style (17th ed.) CitationShih, Hong. A Systematic Study and Characterization of Advanced Corrosion Resistance Materials and Their Applications for Plasma Etching Processes in Semiconductor Silicon Wafer Fabrication. IntechOpen, 2012. https://doi.org/10.5772/31992.
MLA (9th ed.) CitationShih, Hong. A Systematic Study and Characterization of Advanced Corrosion Resistance Materials and Their Applications for Plasma Etching Processes in Semiconductor Silicon Wafer Fabrication. IntechOpen, 2012. https://doi.org/10.5772/31992.
Warning: These citations may not always be 100% accurate.