Plasma-Chemical Kinetics of Film Deposition in Argon-Methane and Argon-Acetylene Mixtures Under Atmospheric Pressure Conditions
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| Main Authors: | , , |
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| Format: | Electronic Book Chapter |
| Language: | English |
| Published: |
IntechOpen
2012
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| Subjects: | |
| Online Access: | https://www.intechopen.com/chapters/29720 |
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| _version_ | 1839566312680980480 |
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| author | Pothiraja, Ramasamy Bibinov, Nikita Awakowicz, Peter |
| author_facet | Pothiraja, Ramasamy Bibinov, Nikita Awakowicz, Peter |
| author_sort | Pothiraja, Ramasamy |
| collection | InTech Open eBooks |
| description | None |
| doi_str_mv | 10.5772/36779 |
| first_indexed | 2025-08-04T22:39:05Z |
| format | Electronic Book Chapter |
| fullrecord | <oai_dc:dc xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd"><identifier>InTech-29720</identifier><datestamp>2012-02-29</datestamp>
<dc:title>Plasma-Chemical Kinetics of Film Deposition in Argon-Methane and Argon-Acetylene Mixtures Under Atmospheric Pressure Conditions</dc:title>
<dc:creator>Ramasamy Pothiraja</dc:creator>
<dc:creator>Nikita Bibinov</dc:creator>
<dc:creator>Peter Awakowicz</dc:creator>
<dc:subject>Physical Sciences, Engineering and Technology</dc:subject>
<dc:description>None</dc:description>
<dc:publisher>IntechOpen</dc:publisher>
<dc:date>2012-02-29</dc:date>
<dc:type>Chapter, Part Of Book</dc:type>
<dc:identifier>https://www.intechopen.com/chapters/29720</dc:identifier>
<dc:identifier>doi:10.5772/36779</dc:identifier>
<dc:language>en</dc:language>
<dc:relation>ISBN:978-953-51-0132-1</dc:relation>
<dc:rights>https://creativecommons.org/licenses/by/3.0/</dc:rights>
<dc:source>https://www.intechopen.com/books/1523 ; Chemical Kinetics</dc:source>
</oai_dc:dc> |
| id | InTech-29720 |
| institution | Matheson Library |
| isbn | 978-953-51-0132-1 |
| language | English |
| last_indexed | 2025-08-04T22:39:05Z |
| publishDate | 2012 |
| publisher | IntechOpen |
| record_format | intech |
| spelling | InTech-297202012-02-29 Plasma-Chemical Kinetics of Film Deposition in Argon-Methane and Argon-Acetylene Mixtures Under Atmospheric Pressure Conditions Ramasamy Pothiraja Nikita Bibinov Peter Awakowicz Physical Sciences, Engineering and Technology None IntechOpen 2012-02-29 Chapter, Part Of Book https://www.intechopen.com/chapters/29720 doi:10.5772/36779 en ISBN:978-953-51-0132-1 https://creativecommons.org/licenses/by/3.0/ https://www.intechopen.com/books/1523 ; Chemical Kinetics |
| spellingShingle | Physical Sciences, Engineering and Technology Pothiraja, Ramasamy Bibinov, Nikita Awakowicz, Peter Plasma-Chemical Kinetics of Film Deposition in Argon-Methane and Argon-Acetylene Mixtures Under Atmospheric Pressure Conditions |
| title | Plasma-Chemical Kinetics of Film Deposition in Argon-Methane and Argon-Acetylene Mixtures Under Atmospheric Pressure Conditions |
| title_full | Plasma-Chemical Kinetics of Film Deposition in Argon-Methane and Argon-Acetylene Mixtures Under Atmospheric Pressure Conditions |
| title_fullStr | Plasma-Chemical Kinetics of Film Deposition in Argon-Methane and Argon-Acetylene Mixtures Under Atmospheric Pressure Conditions |
| title_full_unstemmed | Plasma-Chemical Kinetics of Film Deposition in Argon-Methane and Argon-Acetylene Mixtures Under Atmospheric Pressure Conditions |
| title_short | Plasma-Chemical Kinetics of Film Deposition in Argon-Methane and Argon-Acetylene Mixtures Under Atmospheric Pressure Conditions |
| title_sort | plasma chemical kinetics of film deposition in argon methane and argon acetylene mixtures under atmospheric pressure conditions |
| topic | Physical Sciences, Engineering and Technology |
| url | https://www.intechopen.com/chapters/29720 |
| work_keys_str_mv | AT pothirajaramasamy plasmachemicalkineticsoffilmdepositioninargonmethaneandargonacetylenemixturesunderatmosphericpressureconditions AT bibinovnikita plasmachemicalkineticsoffilmdepositioninargonmethaneandargonacetylenemixturesunderatmosphericpressureconditions AT awakowiczpeter plasmachemicalkineticsoffilmdepositioninargonmethaneandargonacetylenemixturesunderatmosphericpressureconditions |