Double Patterning for Memory ICs
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| Главные авторы: | , |
|---|---|
| Формат: | Электронный ресурс Глава книги |
| Язык: | английский |
| Опубликовано: |
IntechOpen
2011
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| Предметы: | |
| Online-ссылка: | https://www.intechopen.com/chapters/24509 |
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| _version_ | 1839562649916932096 |
|---|---|
| author | Ludwig, Christoph Meyer, Steffen |
| author_facet | Ludwig, Christoph Meyer, Steffen |
| author_sort | Ludwig, Christoph |
| collection | InTech Open eBooks |
| description | None |
| doi_str_mv | 10.5772/23193 |
| first_indexed | 2025-08-04T21:40:52Z |
| format | Electronic Book Chapter |
| fullrecord | <oai_dc:dc xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd"><identifier>InTech-24509</identifier><datestamp>2011-12-02</datestamp>
<dc:title>Double Patterning for Memory ICs</dc:title>
<dc:creator>Christoph Ludwig</dc:creator>
<dc:creator>Steffen Meyer</dc:creator>
<dc:subject>Physical Sciences, Engineering and Technology</dc:subject>
<dc:description>None</dc:description>
<dc:publisher>IntechOpen</dc:publisher>
<dc:date>2011-12-02</dc:date>
<dc:type>Chapter, Part Of Book</dc:type>
<dc:identifier>https://www.intechopen.com/chapters/24509</dc:identifier>
<dc:identifier>doi:10.5772/23193</dc:identifier>
<dc:language>en</dc:language>
<dc:relation>ISBN:978-953-307-602-7</dc:relation>
<dc:rights>https://creativecommons.org/licenses/by/3.0/</dc:rights>
<dc:source>https://www.intechopen.com/books/334 ; Recent Advances in Nanofabrication Techniques and Applications</dc:source>
</oai_dc:dc> |
| id | InTech-24509 |
| institution | Matheson Library |
| isbn | 978-953-307-602-7 |
| language | English |
| last_indexed | 2025-08-04T21:40:52Z |
| publishDate | 2011 |
| publisher | IntechOpen |
| record_format | intech |
| spelling | InTech-245092011-12-02 Double Patterning for Memory ICs Christoph Ludwig Steffen Meyer Physical Sciences, Engineering and Technology None IntechOpen 2011-12-02 Chapter, Part Of Book https://www.intechopen.com/chapters/24509 doi:10.5772/23193 en ISBN:978-953-307-602-7 https://creativecommons.org/licenses/by/3.0/ https://www.intechopen.com/books/334 ; Recent Advances in Nanofabrication Techniques and Applications |
| spellingShingle | Physical Sciences, Engineering and Technology Ludwig, Christoph Meyer, Steffen Double Patterning for Memory ICs |
| title | Double Patterning for Memory ICs |
| title_full | Double Patterning for Memory ICs |
| title_fullStr | Double Patterning for Memory ICs |
| title_full_unstemmed | Double Patterning for Memory ICs |
| title_short | Double Patterning for Memory ICs |
| title_sort | double patterning for memory ics |
| topic | Physical Sciences, Engineering and Technology |
| url | https://www.intechopen.com/chapters/24509 |
| work_keys_str_mv | AT ludwigchristoph doublepatterningformemoryics AT meyersteffen doublepatterningformemoryics |