O2/CH4 Kinetic Mechanisms for Aerospace Applications at Low Pressure and Temperature, Validity Ranges and Comparison

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O2/CH4 Kinetic Mechanisms for Aerospace Applications at Low Pressure and Temperature, Validity Ranges and Comparison

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Bibliographic Details
Main Author:	Minotti, Angelo
Format:	Electronic Book Chapter
Language:	English
Published:	IntechOpen 2011
Subjects:	Physical Sciences, Engineering and Technology
Online Access:	https://www.intechopen.com/chapters/19536
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