BiFeO3 Thin Films Prepared by Chemical Solution Deposition with Approaches for Improvement of Ferroelectricity

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Bibliographic Details
Main Authors: Nakamura, Yoshitaka, Nakashima, Seiji, Okuyama, Masanori
Format: Electronic Book Chapter
Language:English
Published: IntechOpen 2011
Subjects:
Online Access:https://www.intechopen.com/chapters/18057
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author Nakamura, Yoshitaka
Nakashima, Seiji
Okuyama, Masanori
author_facet Nakamura, Yoshitaka
Nakashima, Seiji
Okuyama, Masanori
author_sort Nakamura, Yoshitaka
collection InTech Open eBooks
description None
doi_str_mv 10.5772/16841
first_indexed 2025-08-04T21:28:39Z
format Electronic
Book Chapter
fullrecord <oai_dc:dc xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd"><identifier>InTech-18057</identifier><datestamp>2011-08-24</datestamp> <dc:title>BiFeO3 Thin Films Prepared by Chemical Solution Deposition with Approaches for Improvement of Ferroelectricity</dc:title> <dc:creator>Yoshitaka Nakamura</dc:creator> <dc:creator>Seiji Nakashima</dc:creator> <dc:creator>Masanori Okuyama</dc:creator> <dc:subject>Physical Sciences, Engineering and Technology</dc:subject> <dc:description>None</dc:description> <dc:publisher>IntechOpen</dc:publisher> <dc:date>2011-08-24</dc:date> <dc:type>Chapter, Part Of Book</dc:type> <dc:identifier>https://www.intechopen.com/chapters/18057</dc:identifier> <dc:identifier>doi:10.5772/16841</dc:identifier> <dc:language>en</dc:language> <dc:relation>ISBN:978-953-307-332-3</dc:relation> <dc:rights>https://creativecommons.org/licenses/by-nc-sa/3.0/</dc:rights> <dc:source>https://www.intechopen.com/books/174 ; Ferroelectrics - Material Aspects</dc:source> </oai_dc:dc>
id InTech-18057
institution Matheson Library
isbn 978-953-307-332-3
language English
last_indexed 2025-08-04T21:28:39Z
publishDate 2011
publisher IntechOpen
record_format intech
spelling InTech-180572011-08-24 BiFeO3 Thin Films Prepared by Chemical Solution Deposition with Approaches for Improvement of Ferroelectricity Yoshitaka Nakamura Seiji Nakashima Masanori Okuyama Physical Sciences, Engineering and Technology None IntechOpen 2011-08-24 Chapter, Part Of Book https://www.intechopen.com/chapters/18057 doi:10.5772/16841 en ISBN:978-953-307-332-3 https://creativecommons.org/licenses/by-nc-sa/3.0/ https://www.intechopen.com/books/174 ; Ferroelectrics - Material Aspects
spellingShingle Physical Sciences, Engineering and Technology
Nakamura, Yoshitaka
Nakashima, Seiji
Okuyama, Masanori
BiFeO3 Thin Films Prepared by Chemical Solution Deposition with Approaches for Improvement of Ferroelectricity
title BiFeO3 Thin Films Prepared by Chemical Solution Deposition with Approaches for Improvement of Ferroelectricity
title_full BiFeO3 Thin Films Prepared by Chemical Solution Deposition with Approaches for Improvement of Ferroelectricity
title_fullStr BiFeO3 Thin Films Prepared by Chemical Solution Deposition with Approaches for Improvement of Ferroelectricity
title_full_unstemmed BiFeO3 Thin Films Prepared by Chemical Solution Deposition with Approaches for Improvement of Ferroelectricity
title_short BiFeO3 Thin Films Prepared by Chemical Solution Deposition with Approaches for Improvement of Ferroelectricity
title_sort bifeo3 thin films prepared by chemical solution deposition with approaches for improvement of ferroelectricity
topic Physical Sciences, Engineering and Technology
url https://www.intechopen.com/chapters/18057
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AT nakashimaseiji bifeo3thinfilmspreparedbychemicalsolutiondepositionwithapproachesforimprovementofferroelectricity
AT okuyamamasanori bifeo3thinfilmspreparedbychemicalsolutiondepositionwithapproachesforimprovementofferroelectricity