Studies on Electrical and Retention Enhancement Properties of Metal-Ferroelectric-Insulator-Semiconductor with Radical Irradiation Treatments

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Bibliographic Details
Main Authors: Hai, Le Van, Kanashima, Takeshi, Okuyama, Masanori
Format: Electronic Book Chapter
Language:English
Published: IntechOpen 2011
Subjects:
Online Access:https://www.intechopen.com/chapters/18042
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author Hai, Le Van
Kanashima, Takeshi
Okuyama, Masanori
author_facet Hai, Le Van
Kanashima, Takeshi
Okuyama, Masanori
author_sort Hai, Le Van
collection InTech Open eBooks
description None
doi_str_mv 10.5772/17106
first_indexed 2025-08-04T21:28:37Z
format Electronic
Book Chapter
fullrecord <oai_dc:dc xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd"><identifier>InTech-18042</identifier><datestamp>2011-08-24</datestamp> <dc:title>Studies on Electrical and Retention Enhancement Properties of Metal-Ferroelectric-Insulator-Semiconductor with Radical Irradiation Treatments</dc:title> <dc:creator>Le Van Hai</dc:creator> <dc:creator>Takeshi Kanashima</dc:creator> <dc:creator>Masanori Okuyama</dc:creator> <dc:subject>Physical Sciences, Engineering and Technology</dc:subject> <dc:description>None</dc:description> <dc:publisher>IntechOpen</dc:publisher> <dc:date>2011-08-24</dc:date> <dc:type>Chapter, Part Of Book</dc:type> <dc:identifier>https://www.intechopen.com/chapters/18042</dc:identifier> <dc:identifier>doi:10.5772/17106</dc:identifier> <dc:language>en</dc:language> <dc:relation>ISBN:978-953-307-332-3</dc:relation> <dc:rights>https://creativecommons.org/licenses/by-nc-sa/3.0/</dc:rights> <dc:source>https://www.intechopen.com/books/174 ; Ferroelectrics - Material Aspects</dc:source> </oai_dc:dc>
id InTech-18042
institution Matheson Library
isbn 978-953-307-332-3
language English
last_indexed 2025-08-04T21:28:37Z
publishDate 2011
publisher IntechOpen
record_format intech
spelling InTech-180422011-08-24 Studies on Electrical and Retention Enhancement Properties of Metal-Ferroelectric-Insulator-Semiconductor with Radical Irradiation Treatments Le Van Hai Takeshi Kanashima Masanori Okuyama Physical Sciences, Engineering and Technology None IntechOpen 2011-08-24 Chapter, Part Of Book https://www.intechopen.com/chapters/18042 doi:10.5772/17106 en ISBN:978-953-307-332-3 https://creativecommons.org/licenses/by-nc-sa/3.0/ https://www.intechopen.com/books/174 ; Ferroelectrics - Material Aspects
spellingShingle Physical Sciences, Engineering and Technology
Hai, Le Van
Kanashima, Takeshi
Okuyama, Masanori
Studies on Electrical and Retention Enhancement Properties of Metal-Ferroelectric-Insulator-Semiconductor with Radical Irradiation Treatments
title Studies on Electrical and Retention Enhancement Properties of Metal-Ferroelectric-Insulator-Semiconductor with Radical Irradiation Treatments
title_full Studies on Electrical and Retention Enhancement Properties of Metal-Ferroelectric-Insulator-Semiconductor with Radical Irradiation Treatments
title_fullStr Studies on Electrical and Retention Enhancement Properties of Metal-Ferroelectric-Insulator-Semiconductor with Radical Irradiation Treatments
title_full_unstemmed Studies on Electrical and Retention Enhancement Properties of Metal-Ferroelectric-Insulator-Semiconductor with Radical Irradiation Treatments
title_short Studies on Electrical and Retention Enhancement Properties of Metal-Ferroelectric-Insulator-Semiconductor with Radical Irradiation Treatments
title_sort studies on electrical and retention enhancement properties of metal ferroelectric insulator semiconductor with radical irradiation treatments
topic Physical Sciences, Engineering and Technology
url https://www.intechopen.com/chapters/18042
work_keys_str_mv AT hailevan studiesonelectricalandretentionenhancementpropertiesofmetalferroelectricinsulatorsemiconductorwithradicalirradiationtreatments
AT kanashimatakeshi studiesonelectricalandretentionenhancementpropertiesofmetalferroelectricinsulatorsemiconductorwithradicalirradiationtreatments
AT okuyamamasanori studiesonelectricalandretentionenhancementpropertiesofmetalferroelectricinsulatorsemiconductorwithradicalirradiationtreatments