APA (7th ed.) Citation

Hai, L. V., Kanashima, T., & Okuyama, M. (2011). Studies on Electrical and Retention Enhancement Properties of Metal-Ferroelectric-Insulator-Semiconductor with Radical Irradiation Treatments. IntechOpen. https://doi.org/10.5772/17106

Chicago Style (17th ed.) Citation

Hai, Le Van, Takeshi Kanashima, and Masanori Okuyama. Studies on Electrical and Retention Enhancement Properties of Metal-Ferroelectric-Insulator-Semiconductor with Radical Irradiation Treatments. IntechOpen, 2011. https://doi.org/10.5772/17106.

MLA (9th ed.) Citation

Hai, Le Van, et al. Studies on Electrical and Retention Enhancement Properties of Metal-Ferroelectric-Insulator-Semiconductor with Radical Irradiation Treatments. IntechOpen, 2011. https://doi.org/10.5772/17106.