Growth of Vertically Aligned Carbon Nanotubes by RF-DC Plasma Chemical Vapor Deposition
None
Saved in:
| Main Authors: | Hayashi, Yasuaki, Sawada, Hideto, Takagi, Hideyuki |
|---|---|
| Format: | Electronic Book Chapter |
| Language: | English |
| Published: |
IntechOpen
2011
|
| Subjects: | |
| Online Access: | https://www.intechopen.com/chapters/16987 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Direct Growth of Carbon Nanotubes on Metal Supports by Chemical Vapor Deposition
by: Zhao, Naiqin, et al.
Published: (2011) -
Dielectrophoretic Deposition and Alignment of Carbon Nanotubes
by: Xue, Wei, et al.
Published: (2011) -
Chemical Vapor Deposition of Graphene
by: Miao, Congqin, et al.
Published: (2011) -
Plasma Enhanced Chemical Vapor Deposited Materials and Organic Semiconductors in Photovoltaic Devices
by: A. Kosarev, et al.
Published: (2020-10-01) -
Vertically Aligned Carbon Nanotube Mechano‐Electrochemical Generator for Ultralow‐Frequency Ocean Wave Monitoring
by: Hyeon Jun Sim, et al.
Published: (2025-07-01)


