Changes of Crystal Structure and Electrical Properties with Film Thickness and Zr/(Zr+Ti) Ratio for Epitaxial Pb(Zr,Ti)O3 Films Grown on (100)cSrRuO3//(100)SrTiO3 Substrates by Metalorganic Chemical Vapor Deposition

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Main Authors: Chentir, Mohamed-Tahar, Morioka, Hitoshi, Ehara, Yoshitaka, Saito, Keisuke, Yokoyama, Shintaro, Oikawa, Takahiro, Funakubo, Hiroshi
Format: Electronic Book Chapter
Language:English
Published: IntechOpen 2011
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Online Access:https://www.intechopen.com/chapters/16608
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author Chentir, Mohamed-Tahar
Morioka, Hitoshi
Ehara, Yoshitaka
Saito, Keisuke
Yokoyama, Shintaro
Oikawa, Takahiro
Funakubo, Hiroshi
author_facet Chentir, Mohamed-Tahar
Morioka, Hitoshi
Ehara, Yoshitaka
Saito, Keisuke
Yokoyama, Shintaro
Oikawa, Takahiro
Funakubo, Hiroshi
author_sort Chentir, Mohamed-Tahar
collection InTech Open eBooks
description None
doi_str_mv 10.5772/17740
first_indexed 2025-08-04T21:44:39Z
format Electronic
Book Chapter
fullrecord <oai_dc:dc xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd"><identifier>InTech-16608</identifier><datestamp>2011-08-23</datestamp> <dc:title>Changes of Crystal Structure and Electrical Properties with Film Thickness and Zr/(Zr+Ti) Ratio for Epitaxial Pb(Zr,Ti)O3 Films Grown on (100)cSrRuO3//(100)SrTiO3 Substrates by Metalorganic Chemical Vapor Deposition</dc:title> <dc:creator>Mohamed-Tahar Chentir</dc:creator> <dc:creator>Hitoshi Morioka</dc:creator> <dc:creator>Yoshitaka Ehara</dc:creator> <dc:creator>Keisuke Saito</dc:creator> <dc:creator>Shintaro Yokoyama</dc:creator> <dc:creator>Takahiro Oikawa</dc:creator> <dc:creator>Hiroshi Funakubo</dc:creator> <dc:subject>Physical Sciences, Engineering and Technology</dc:subject> <dc:description>None</dc:description> <dc:publisher>IntechOpen</dc:publisher> <dc:date>2011-08-23</dc:date> <dc:type>Chapter, Part Of Book</dc:type> <dc:identifier>https://www.intechopen.com/chapters/16608</dc:identifier> <dc:identifier>doi:10.5772/17740</dc:identifier> <dc:language>en</dc:language> <dc:relation>ISBN:978-953-307-455-9</dc:relation> <dc:rights>https://creativecommons.org/licenses/by-nc-sa/3.0/</dc:rights> <dc:source>https://www.intechopen.com/books/428 ; Ferroelectrics - Characterization and Modeling</dc:source> </oai_dc:dc>
id InTech-16608
institution Matheson Library
isbn 978-953-307-455-9
language English
last_indexed 2025-08-04T21:44:39Z
publishDate 2011
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record_format intech
spelling InTech-166082011-08-23 Changes of Crystal Structure and Electrical Properties with Film Thickness and Zr/(Zr+Ti) Ratio for Epitaxial Pb(Zr,Ti)O3 Films Grown on (100)cSrRuO3//(100)SrTiO3 Substrates by Metalorganic Chemical Vapor Deposition Mohamed-Tahar Chentir Hitoshi Morioka Yoshitaka Ehara Keisuke Saito Shintaro Yokoyama Takahiro Oikawa Hiroshi Funakubo Physical Sciences, Engineering and Technology None IntechOpen 2011-08-23 Chapter, Part Of Book https://www.intechopen.com/chapters/16608 doi:10.5772/17740 en ISBN:978-953-307-455-9 https://creativecommons.org/licenses/by-nc-sa/3.0/ https://www.intechopen.com/books/428 ; Ferroelectrics - Characterization and Modeling
spellingShingle Physical Sciences, Engineering and Technology
Chentir, Mohamed-Tahar
Morioka, Hitoshi
Ehara, Yoshitaka
Saito, Keisuke
Yokoyama, Shintaro
Oikawa, Takahiro
Funakubo, Hiroshi
Changes of Crystal Structure and Electrical Properties with Film Thickness and Zr/(Zr+Ti) Ratio for Epitaxial Pb(Zr,Ti)O3 Films Grown on (100)cSrRuO3//(100)SrTiO3 Substrates by Metalorganic Chemical Vapor Deposition
title Changes of Crystal Structure and Electrical Properties with Film Thickness and Zr/(Zr+Ti) Ratio for Epitaxial Pb(Zr,Ti)O3 Films Grown on (100)cSrRuO3//(100)SrTiO3 Substrates by Metalorganic Chemical Vapor Deposition
title_full Changes of Crystal Structure and Electrical Properties with Film Thickness and Zr/(Zr+Ti) Ratio for Epitaxial Pb(Zr,Ti)O3 Films Grown on (100)cSrRuO3//(100)SrTiO3 Substrates by Metalorganic Chemical Vapor Deposition
title_fullStr Changes of Crystal Structure and Electrical Properties with Film Thickness and Zr/(Zr+Ti) Ratio for Epitaxial Pb(Zr,Ti)O3 Films Grown on (100)cSrRuO3//(100)SrTiO3 Substrates by Metalorganic Chemical Vapor Deposition
title_full_unstemmed Changes of Crystal Structure and Electrical Properties with Film Thickness and Zr/(Zr+Ti) Ratio for Epitaxial Pb(Zr,Ti)O3 Films Grown on (100)cSrRuO3//(100)SrTiO3 Substrates by Metalorganic Chemical Vapor Deposition
title_short Changes of Crystal Structure and Electrical Properties with Film Thickness and Zr/(Zr+Ti) Ratio for Epitaxial Pb(Zr,Ti)O3 Films Grown on (100)cSrRuO3//(100)SrTiO3 Substrates by Metalorganic Chemical Vapor Deposition
title_sort changes of crystal structure and electrical properties with film thickness and zr zr ti ratio for epitaxial pb zr ti o3 films grown on 100 csrruo3 100 srtio3 substrates by metalorganic chemical vapor deposition
topic Physical Sciences, Engineering and Technology
url https://www.intechopen.com/chapters/16608
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