Fabrication and Study on One-Transistor-Capacitor Structure of Nonvolatile Random Access Memory TFT Devices Using Ferroelectric Gated Oxide Film
None
Saved in:
Main Authors: | , , , , , |
---|---|
Format: | Electronic Book Chapter |
Language: | English |
Published: |
IntechOpen
2011
|
Subjects: | |
Online Access: | https://www.intechopen.com/chapters/16179 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
_version_ | 1839562884261085184 |
---|---|
author | Cheng, Chien-Min Chen, Kai-Huang Lin, Chun-Cheng Chen, Ying-Chung Chen, Chih-Sheng Chang, Ping-Kuan |
author_facet | Cheng, Chien-Min Chen, Kai-Huang Lin, Chun-Cheng Chen, Ying-Chung Chen, Chih-Sheng Chang, Ping-Kuan |
author_sort | Cheng, Chien-Min |
collection | InTech Open eBooks |
description | None |
doi_str_mv | 10.5772/16405 |
first_indexed | 2025-08-04T21:44:36Z |
format | Electronic Book Chapter |
fullrecord | <oai_dc:dc xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd"><identifier>InTech-16179</identifier><datestamp>2011-08-23</datestamp>
<dc:title>Fabrication and Study on One-Transistor-Capacitor Structure of Nonvolatile Random Access Memory TFT Devices Using Ferroelectric Gated Oxide Film</dc:title>
<dc:creator>Chien-Min Cheng</dc:creator>
<dc:creator>Kai-Huang Chen</dc:creator>
<dc:creator>Chun-Cheng Lin</dc:creator>
<dc:creator>Ying-Chung Chen</dc:creator>
<dc:creator>Chih-Sheng Chen</dc:creator>
<dc:creator>Ping-Kuan Chang</dc:creator>
<dc:subject>Physical Sciences, Engineering and Technology</dc:subject>
<dc:description>None</dc:description>
<dc:publisher>IntechOpen</dc:publisher>
<dc:date>2011-08-23</dc:date>
<dc:type>Chapter, Part Of Book</dc:type>
<dc:identifier>https://www.intechopen.com/chapters/16179</dc:identifier>
<dc:identifier>doi:10.5772/16405</dc:identifier>
<dc:language>en</dc:language>
<dc:relation>ISBN:978-953-307-456-6</dc:relation>
<dc:rights>https://creativecommons.org/licenses/by-nc-sa/3.0/</dc:rights>
<dc:source>https://www.intechopen.com/books/429 ; Ferroelectrics - Applications</dc:source>
</oai_dc:dc> |
id | InTech-16179 |
institution | Matheson Library |
isbn | 978-953-307-456-6 |
language | English |
last_indexed | 2025-08-04T21:44:36Z |
publishDate | 2011 |
publisher | IntechOpen |
record_format | intech |
spelling | InTech-161792011-08-23 Fabrication and Study on One-Transistor-Capacitor Structure of Nonvolatile Random Access Memory TFT Devices Using Ferroelectric Gated Oxide Film Chien-Min Cheng Kai-Huang Chen Chun-Cheng Lin Ying-Chung Chen Chih-Sheng Chen Ping-Kuan Chang Physical Sciences, Engineering and Technology None IntechOpen 2011-08-23 Chapter, Part Of Book https://www.intechopen.com/chapters/16179 doi:10.5772/16405 en ISBN:978-953-307-456-6 https://creativecommons.org/licenses/by-nc-sa/3.0/ https://www.intechopen.com/books/429 ; Ferroelectrics - Applications |
spellingShingle | Physical Sciences, Engineering and Technology Cheng, Chien-Min Chen, Kai-Huang Lin, Chun-Cheng Chen, Ying-Chung Chen, Chih-Sheng Chang, Ping-Kuan Fabrication and Study on One-Transistor-Capacitor Structure of Nonvolatile Random Access Memory TFT Devices Using Ferroelectric Gated Oxide Film |
title | Fabrication and Study on One-Transistor-Capacitor Structure of Nonvolatile Random Access Memory TFT Devices Using Ferroelectric Gated Oxide Film |
title_full | Fabrication and Study on One-Transistor-Capacitor Structure of Nonvolatile Random Access Memory TFT Devices Using Ferroelectric Gated Oxide Film |
title_fullStr | Fabrication and Study on One-Transistor-Capacitor Structure of Nonvolatile Random Access Memory TFT Devices Using Ferroelectric Gated Oxide Film |
title_full_unstemmed | Fabrication and Study on One-Transistor-Capacitor Structure of Nonvolatile Random Access Memory TFT Devices Using Ferroelectric Gated Oxide Film |
title_short | Fabrication and Study on One-Transistor-Capacitor Structure of Nonvolatile Random Access Memory TFT Devices Using Ferroelectric Gated Oxide Film |
title_sort | fabrication and study on one transistor capacitor structure of nonvolatile random access memory tft devices using ferroelectric gated oxide film |
topic | Physical Sciences, Engineering and Technology |
url | https://www.intechopen.com/chapters/16179 |
work_keys_str_mv | AT chengchienmin fabricationandstudyononetransistorcapacitorstructureofnonvolatilerandomaccessmemorytftdevicesusingferroelectricgatedoxidefilm AT chenkaihuang fabricationandstudyononetransistorcapacitorstructureofnonvolatilerandomaccessmemorytftdevicesusingferroelectricgatedoxidefilm AT linchuncheng fabricationandstudyononetransistorcapacitorstructureofnonvolatilerandomaccessmemorytftdevicesusingferroelectricgatedoxidefilm AT chenyingchung fabricationandstudyononetransistorcapacitorstructureofnonvolatilerandomaccessmemorytftdevicesusingferroelectricgatedoxidefilm AT chenchihsheng fabricationandstudyononetransistorcapacitorstructureofnonvolatilerandomaccessmemorytftdevicesusingferroelectricgatedoxidefilm AT changpingkuan fabricationandstudyononetransistorcapacitorstructureofnonvolatilerandomaccessmemorytftdevicesusingferroelectricgatedoxidefilm |