APA (7th ed.) Citation

Hijikata, Y., Yaguchi, H., & Yoshida, S. (2011). Growth Rate Enhancement of Silicon-Carbide Oxidation in Thin Oxide Regime. IntechOpen. https://doi.org/10.5772/14591

Chicago Style (17th ed.) Citation

Hijikata, Yasuto, Hiroyuki Yaguchi, and Sadafumi Yoshida. Growth Rate Enhancement of Silicon-Carbide Oxidation in Thin Oxide Regime. IntechOpen, 2011. https://doi.org/10.5772/14591.

MLA (9th ed.) Citation

Hijikata, Yasuto, et al. Growth Rate Enhancement of Silicon-Carbide Oxidation in Thin Oxide Regime. IntechOpen, 2011. https://doi.org/10.5772/14591.