Habuka, H. (2011). Low Temperature Chemical Vapour Deposition of Polycrystalline Silicon Carbide Film Using Monomethylsilane Gas. IntechOpen. https://doi.org/10.5772/14635
Chicago Style (17th ed.) CitationHabuka, Hitoshi. Low Temperature Chemical Vapour Deposition of Polycrystalline Silicon Carbide Film Using Monomethylsilane Gas. IntechOpen, 2011. https://doi.org/10.5772/14635.
MLA (9th ed.) CitationHabuka, Hitoshi. Low Temperature Chemical Vapour Deposition of Polycrystalline Silicon Carbide Film Using Monomethylsilane Gas. IntechOpen, 2011. https://doi.org/10.5772/14635.
Warning: These citations may not always be 100% accurate.