Volatile Precursors for Films Deposition: Vapor Pressure, Structure and Thermodynamics

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Volatile Precursors for Films Deposition: Vapor Pressure, Structure and Thermodynamics

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Bibliographic Details
Main Authors:	Igumenov, Igor K., Basova, Tamara V., Belosludov, Vladimir R.
Format:	Electronic Book Chapter
Language:	English
Published:	IntechOpen 2011
Subjects:	Physical Sciences, Engineering and Technology
Online Access:	https://www.intechopen.com/chapters/13127
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