Volatile Precursors for Films Deposition: Vapor Pressure, Structure and Thermodynamics
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| Main Authors: | , , |
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| Format: | Electronic Book Chapter |
| Language: | English |
| Published: |
IntechOpen
2011
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| Online Access: | https://www.intechopen.com/chapters/13127 |
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| _version_ | 1839565616338436096 |
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| author | Igumenov, Igor K. Basova, Tamara V. Belosludov, Vladimir R. |
| author_facet | Igumenov, Igor K. Basova, Tamara V. Belosludov, Vladimir R. |
| author_sort | Igumenov, Igor K. |
| collection | InTech Open eBooks |
| description | None |
| doi_str_mv | 10.5772/13356 |
| first_indexed | 2025-08-04T22:28:01Z |
| format | Electronic Book Chapter |
| fullrecord | <oai_dc:dc xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd"><identifier>InTech-13127</identifier><datestamp>2011-01-14</datestamp>
<dc:title>Volatile Precursors for Films Deposition: Vapor Pressure, Structure and Thermodynamics</dc:title>
<dc:creator>Igor K. Igumenov</dc:creator>
<dc:creator>Tamara V. Basova</dc:creator>
<dc:creator>Vladimir R. Belosludov</dc:creator>
<dc:subject>Physical Sciences, Engineering and Technology</dc:subject>
<dc:description>None</dc:description>
<dc:publisher>IntechOpen</dc:publisher>
<dc:date>2011-01-14</dc:date>
<dc:type>Chapter, Part Of Book</dc:type>
<dc:identifier>https://www.intechopen.com/chapters/13127</dc:identifier>
<dc:identifier>doi:10.5772/13356</dc:identifier>
<dc:language>en</dc:language>
<dc:relation>ISBN:978-953-307-980-6</dc:relation>
<dc:rights>https://creativecommons.org/licenses/by-nc-sa/3.0/</dc:rights>
<dc:source>https://www.intechopen.com/books/1293 ; Application of Thermodynamics to Biological and Materials Science</dc:source>
</oai_dc:dc> |
| id | InTech-13127 |
| institution | Matheson Library |
| isbn | 978-953-307-980-6 |
| language | English |
| last_indexed | 2025-08-04T22:28:01Z |
| publishDate | 2011 |
| publisher | IntechOpen |
| record_format | intech |
| spelling | InTech-131272011-01-14 Volatile Precursors for Films Deposition: Vapor Pressure, Structure and Thermodynamics Igor K. Igumenov Tamara V. Basova Vladimir R. Belosludov Physical Sciences, Engineering and Technology None IntechOpen 2011-01-14 Chapter, Part Of Book https://www.intechopen.com/chapters/13127 doi:10.5772/13356 en ISBN:978-953-307-980-6 https://creativecommons.org/licenses/by-nc-sa/3.0/ https://www.intechopen.com/books/1293 ; Application of Thermodynamics to Biological and Materials Science |
| spellingShingle | Physical Sciences, Engineering and Technology Igumenov, Igor K. Basova, Tamara V. Belosludov, Vladimir R. Volatile Precursors for Films Deposition: Vapor Pressure, Structure and Thermodynamics |
| title | Volatile Precursors for Films Deposition: Vapor Pressure, Structure and Thermodynamics |
| title_full | Volatile Precursors for Films Deposition: Vapor Pressure, Structure and Thermodynamics |
| title_fullStr | Volatile Precursors for Films Deposition: Vapor Pressure, Structure and Thermodynamics |
| title_full_unstemmed | Volatile Precursors for Films Deposition: Vapor Pressure, Structure and Thermodynamics |
| title_short | Volatile Precursors for Films Deposition: Vapor Pressure, Structure and Thermodynamics |
| title_sort | volatile precursors for films deposition vapor pressure structure and thermodynamics |
| topic | Physical Sciences, Engineering and Technology |
| url | https://www.intechopen.com/chapters/13127 |
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