Composition depth profiles and the effects of annealing for ion-implated alloys /
Saved in:
Main Author: | Campbell, Arthur Byron, 1924- |
---|---|
Corporate Author: | United States. Bureau of Mines |
Other Authors: | Sartwell, Bruce D., Needham, Paul B. |
Format: | Unknown |
Language: | English |
Published: |
[Washington] :
U.S. Dept. of the Interior, Bureau of Mines,
1979.
|
Series: | Report of investigations (United States. Bureau of Mines) ;�387
|
Subjects: | |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Characterization of alloys formed by ion implantation /
Published: (1980) -
Electrochemical corrosion behavior of alloys formed by ion implantation /
Published: (1979) -
Turning the optical properties of microcrystalline diamond films by boron ion implantation and annealing
by: Dan Dai, et al.
Published: (2024-12-01) -
Surface modification of metals by ion beams: proceedings of the International Conference on Surface Modification of Metals by Ion Beams, Kingston, Ontario, Canada, July 7-11, 1986 /
Published: (1987) -
Effect of ion energy and fluence on the electrical resistivity of silver implanted copper surface
by: Bharti Malvi, et al.
Published: (2025-09-01)