Deposition and growth : limits for microelectronics, Anaheim, CA, 1987 /

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Bibliographic Details
Corporate Author: American Institute of Physics
Other Authors: Rubloff, G. W.
Format: Book
Language:English
Published: New York : American Institute of Physics, 1988.
Series:American Vacuum Society series ; 4
AIP conference proceedings. no. 167.
Subjects:
Thin films.
Microelectronics > Materials.
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