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    Effect of Inductively Coupled Plasma Etching Parameters on n-Al<sub>0.5</sub>Ga<sub>0.5</sub>N Ohmic Contact

    Effect of Inductively Coupled Plasma Etching Parameters on n-Al<sub>0.5</sub>Ga<sub>0.5</sub>N Ohmic Contact by Shanshan Yang, Meixin Feng, Yuzhen Liu, Wenjun Xiong, Biao Deng, Yingnan Huang, Chuanjie Li, Qiming Xu, Yanwei Shen, Qian Sun, Hui Yang

    Published 2024-01-01
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