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    Low Resistivity and High Carrier Concentration in SnO<sub>2</sub> Thin Films: The Impact of Nitrogen–Hydrogen Annealing Treatments

    Low Resistivity and High Carrier Concentration in SnO<sub>2</sub> Thin Films: The Impact of Nitrogen–Hydrogen Annealing Treatments by Qi-Zhen Chen, Zhi-Xuan Zhang, Wan-Qiang Fu, Jing-Ru Duan, Yu-Xin Yang, Chao-Nan Chen, Shui-Yang Lien

    Published 2025-06-01

    The tin dioxide (SnO<sub>2</sub>) thin films in this work were prepared by using plasma-enhanced atomic layer deposition (PEALD), and a systematic analysis was conducted to evaluate the influence of post-deposition annealing at various temperatures in a nitrogen–hydrogen mixed atmosphere...

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